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Thin-Film Thickness, Flatness and Hardness Metrology Equipment Suppliers
Compiled by Terrence Thompson, Contributing Editor
This annual Vacuum Technology & Coating product showcase includes many of instruments and equipment used to quantify thin film thickness, flatness and hardness of most deposited materials.
For precise thin film thickness, flatness and hardness measurement instruments, there are numerous choices for measuring existing films. Metrology for coating thickness or thin-film measurements may involve ellipsometry and scanning spectrophotometry as well as non-contact surface roughness and surface profiling measurements. Surface profilers are very sophisticated and can measure surface profiles and/or roughness with sub-micron resolutions.
Decisions, Decisions
After you determine exactly what needs to be measured, check the most logical technologies. There may be a trade-off between cost and performance. Simpler methodologies often do the job for less demanding applications while the more exotic instruments are needed for very demanding applications where tolerances are tight. If you are checking wafer fabricated ICs or MEMS devices, tolerances are very tight. With optical coatings, thickness and material uniformity are essential. Many solutions exist for measuring thin film properties and more than one will likely meet your requirements.
Product Descriptions
In the following product descriptions, vendors make distinctions to focus on specific intended applications so direct comparisons are difficult. For more information, go to Vacuum Technology & Coating magazine’s home page at and click on the advertiser links for additional details or telephone numbers for calling to discuss your specific application requirements.
Model 54-4 Four Channel Transmissometer with Transmitter, Receiver, Projector and Collector Accessories
The DYN-OPTICS™ Model 54-4 Four Channel Transmissometer has measuring heads within the vacuum chamber and measures transmission of various coatings on flexible film in a continuous coating application. The four channels can be located across the film to measure uniformity of coating. Alternatively, one channel can measure transmission of an initial coating and the other three channels can measure uniformity across the film after a coating. In some applications, a computer can correct the desired transmission of the final coating to compensate for variations in the pre-coat. The instrument can measure the film in air or by means of fiber optics that can measure the transmission in a vacuum chamber. Transmissometers have been made with the number of channels varying from one to fourteen.
Dyn-Optics
Sparta, NJ 07871
Tel: 1-949-581-7430
F50 Automated Thin-Film Thickness Mapping System
Filmetrics’ F50 measures thin-film thickness and n and k are mapped quickly and easily based upon our advanced spectral reflectance system. The motorized R-• stage moves automatically to selected measurement points and provides thickness measurements in seconds. Choose one of the dozens of predefined polar, rectangular, or linear map patterns, or create your own with no limit on the number of measurement points. The entire desktop system is set up in minutes and easily used by anyone with basic computer skills. www.filmetrics.com
F40 Thickness and Optical Constants Measurement System
Filmetrics’ F40 converts your microscope into a Thin Film Thickness Measuring Tool. Film thicknesses are measured quickly and easily with this Filmetrics advanced spectrometry systems. Spectral analysis of reflections from the top and bottom of the thin film provides thickness in seconds. For measurements on patterned surfaces and other applications that require a spot size as small as 10 microns, just add the model F40 to the microscope. For common microscopes, the F40 is a simple bolt-on attachment, complete with a c-mount and a CCD camera. www.filmetrics.com
F10-VC Simultaneous Reflectance and Transmittance Measurement System
Filmetrics’ F10-VC measures reflectance and transmittance simultaneously and is designed especially for vacuum coating applications. For a fraction of the price of legacy systems, users can analyze reflectance and transmittance spectra, including automated min/max, FWHM, and color analysis. A laptop and 2-year warranty are provided with the system, making the F10-VC a complete, turn-key package. This low-cost system can be upgraded with film thickness and index solving modules.
Filmetrics, Inc.
San Diego, CA 92123
www.filmetrics.com
Contact: Michael Klayman
Tel: 1-858-573-9300
E-mail: info@filmetrics.com or klayman@filmetrics.com
Auto SE™ : Thin Film Analysis in One Push of a Button
HORIBA Jobin Yvon introduces the Auto SE™, a new and innovative thin film analysis tool that allows characterization of single and multi layers thin films in one push of a button. Within a second, the Auto SE provides accurate film thicknesses and optical constants by acquiring hundreds of wavelengths over a spectral range of 440 nm to 850 nm. As soon as you press the START button, the Auto SE automatically adjusts the height of your sample, maps the entire surface of your wafer for uniformity check and displays the results in a simple way. With a spot size as small as 25 µm × 60 µm and its patented MyAutoView™ color vision system, the Auto SE is the perfect thin film metrology tool for devices characterization and QC analysis of your thin films. www.jobinyvon.com/usadivisions/TFilms/
Adding Reflectometry to Spectroscopic Ellipsometry Simplifies Characterization of Transparent Materials
HORIBA Jobin Yvon extends the capabilities of its UVISEL spectroscopic ellipsometer with the addition of an add-on normal incidence reflectometer. Reflectometry offers much simpler and faster (though less comprehensive) characterization of film thickness and index of refraction of transparent materials. Therefore, films thickness for common materials such as thermal grown oxide or stochiometric nitride, can now be quickly measured by the UVISEL RM in the push of a button. The new reflectometer collects normal incidence reflectance spectra over a broad spectral range of 210 nm to 2100 nm, with a spot size of 200 µm. For more complex or absorbing materials such as doped semiconductors or metals, optical constants can first be determined by the UVISEL RM in spectroscopic ellipsometry mode and then fed into the reflectometer for fast thickness uniformity measurements. By combining reflectometry and ellipsometry measurements, the UVISEL RM extends the range of measurable film thickness and provides a unique tool that fulfils both engineering and production needs.
HORIBA Jobin Yvon
Edison, NJ
www.jobinyvon.com/usadivisions/TFilms/
www.autose.org
Tel: 1-866-jobinyvon toll free or 1-732 494 8660 Ext. 117
E-mail: tfd-sales@jobinyvon.fr
AccuMap-SE® Combines A High-Speed M-2000® Spectroscopic Ellipsometer
Characterizing thin film uniformity of large panels just got easier. The J. A. Woollam Co., Inc. AccuMap-SE® combines a high-speed M-2000® spectroscopic ellipsometer with fast mapping for large areas. Gain confidence about your coatings that only accurate spectroscopic ellipsometry measurements can provide. The broad spectral range of the M-2000 is well suited to all thin films in photovoltaic and flat panel display applications. Map uniformity of film thickness and optical constants for a wide range of coatings: amorphous, microcrystalline and polycrystalline silicon, CIGS, CdTe/CdS, transparent conductive oxides (ITO, SnO2:F, AZO, etc.).
J. A. Woollam Co., Inc.
Lincoln, NE
www.jawoollam.com
Contact: Veronica Inlow, Marketing Coordinator
Tel: 1-402-477-7501 Ext. 101
E-mail: vinlow@jawoollam.com
Aleris™ Film Metrology Family Extended with Two New Systems
KLA-Tencor has additions to its Aleris™ family of films metrology systems – the Aleris 8310 and Aleris 8350. These systems utilize KLA-Tencor’s new generation of Broadband Spectroscopic Ellipsometry (BBSE) optics which allow chipmakers to measure multi-layer film thickness, refractive index and stress, meeting advanced films metrology requirements. The Aleris products allow chipmakers to pick a highly configurable set of advanced film metrology tools that cover both high-volume production fabs and future node development with a single platform architecture. The Aleris uses SpectraFx 200 technology with different models aimed at different fab applications.
MetriX 100™ Provides Production Line Monitoring Of Film Composition and Thickness Measurements
KLA-Tencor‘s MetriX 100™ is an inline, non-contact metal films metrology system to provide independent measurements of film composition and thickness on product wafers. With film composition becoming as critical as film thickness in determining the functionality and reliability of advanced ICs, MetriX 100's ability to measure both parameters makes it an ideal tool for production line monitoring at the 90-nm node and process development for the 65-nm and below nodes. MetriX 100 uses a versatile electronbeam technology, coupled with proprietary high-resolution x-ray detectors and software algorithms, to provide industry-leading precision and repeatability (to within one percent, one sigma). This unique combination allows the tool to be used for a wide range of applications—from process development and characterization of ultra-thin atomic layer deposition (ALD) barrier films to routine production monitoring of copper barrier/seed and other yield-limiting critical layers such as silicon oxynitride (SiON) gate dielectrics. MetriX 100 is currently undergoing beta testing at multiple leading-edge IC manufacturing facilities.
KLA-Tencor
San Jose,CA
Tel: 1-408-875-9733
Layer Thickness Measurement Package
The m·u·t GmbH’Layer Thickness Measurement Package consists of the TRISTAN® spectrometer, a special reading head and our new Software. The system is able to measure transparent layers with a thickness of 0.1 µm to 20 µm under the pre-condition where the base material is transparent or intense reflective. Then it is also able to detect up to three different layers on one sample. The reading head can be adopted to special customer needs (e.g. shape, handling, etc.). A special table for desktop measurements of layer thicknesses is available.
m·u·t GmbH
Wedel, Germany
Tel.: +49-0-4103-9308-0
1500-D Analyzer Accurately Measures Thickness of Diamond-Like Coatings (DLC) On Perpendicular Recording Media for Next Generation Disk Drives
n&k Technology, Inc. has a software module that adds the capability to the n&k 1500-D Analyzer of characterizing DLC on perpendicular recording media. The software package enables the 1500-D user to effectively characterize the latest magnetic media that are substantially more complex than older generation media and allow much higher recording densities. The data storage industry is rapidly moving to significantly higher recording densities in response to competition from FLASH memory and an increased penetration of the consumer market with such products as game boxes, DVR, in-car navigation, and various music and video players. Combined with the n&k 1500-D Analyzer that is used to characterize the latest giant magnetoresistive (GMR) heads for next generation disk drive metrology.
n&k Technology, Inc.
Santa Clara, CA
Tel: 1-408-513-3800
Lynx™ Metrology System
Nanometrics Incorporated announced its new Lynx™ metrology platform. The Lynx is a compact 300mm cluster metrology platform to enable thin film, optical critical dimension (OCD) and overlay measurements in a single system. The Lynx’s versatility provides for a range of custom configurations, from a streamlined single metrology platform to an expanded, high-productivity, multi-metrology platform. Modules can be easily installed or upgraded to extend system capabilities. Productivity of the Lynx system is optimized by Nanometrics’ proprietary cluster control software which allows for sequence and recipe customization in a high-volume production environment. The Lynx’s compact and versatile cluster architecture typically provides a 30% smaller footprint in the fab, a 30% reduction in tool-to-tool wafer transportation and a 50% reduction in installation and facilities costs.
Atlas® Advanced Metrology System
The Nanometrics Atlas metrology system accommodates both 200- or 300-mm wafer metrology. The system incorporates a dual-arm robot, high-precision stage and high-speed focus system. The Atlas also features robust pattern recognition, improved thickness reproducibility and superior SR (135 WPH for five-site measurement) and SE (90 WPH for five-site measurement) throughput. The N2000 software interface and advanced automation are compliant with standards adopted by SEMI and other organizations. The NanoNet feature, a network component of Nanometrics’N2000 Analysis Platform software provides system-to-system matching and seamless recipe transferability. The Nanometrics Atlas system can be configured with any combination of the following metrology modules: Spectroscopic reflectometer (SR); Spectroscopic ellipsometer (SE); Optical critical dimension (OCD); Diffraction based overlay (DBO); and Wafer stress/bow. n&k Analyzer solutions are distinguished by an excellent signal-to-noise ratio over the entire deep-UV to near-IR (190 to 1,000 nm) wavelength range. This is a result of our patented all-reflective optics design and is essential for many applications. Metrology tools with a limitedwavelength range, or increased noise suffer in terms of capabilities and measurement stability.
NanoSpec 9200 Advanced 200mm Film Analysis System
The Nanometrics NanoSpec 9200 thin film measurement system provides DUV-visible spectroscopic reflectometry in a high throughput, small footprint platform for the highest level of equipment utilization and the most comprehensive analysis possible of film thickness and material optical constants. The system is capable of handling 150mm and 200mm wafers. This system builds on technologies from the NanoSpec 9000 integrated film thickness system to provide users with a compact tool with high wafer throughput. The NanoSpec 9200 provides IC manufacturers with the fastest, most reliable, compact and cost-effective tool available for volume production, featuring the latest generation spectroscopic reflectometer, flawless pattern recognition, auto-focus, and auto-positioning stage and robotic wafer handling capabilities. This workhorse system is capable of measuring 200 wafers per hour.
Nanometrics, Inc.
Milpitas, CA
Tel: 1-408-435-9600
SuperQ Thin Film and Solar Cell Analysis Solution
PANalytical’s new SuperQ 4.0 Thin Film package features updated Fundamental Parameter Software (FP Multi) for the analysis of complex multi-layer stacks, with best in class performance on up to 16 layers. It is also now possible to measure and track wafers throughout various deposition steps, until a film stack is completed. For each measurement, the results of the previous steps are taken into account, delivering rapid and automatic verification of layer and stack thickness and composition across the complete wafer. The software makes it easy for even relatively inexperienced staff to run day-to-day analysis. It delivers power- ful data on thickness, composition, stoichiometry, dopant levels and uniformity for a wide range of layer types and stacks.
PANalytical, a spectris company
Almelo, The Netherlands
Tel: +31 0 546 534383
MetaPULSE-II™ 200 Small-Spot Multi-Wavelength Laser Ellipsometer
Rudolph’s MetaPULSE-II is a second-generation PULSE™ Technology system. Rudolph's unique sonar metrology provides production-worthy on-product opaque plus transparent film measurements of the thinnest to the thickest films used in state-of-the-art semiconductor manufacturing. PULSE can simultaneously determine the individual thicknesses of five or more layers in a multi-layer metal (MLM) film stack. Meta PULSE - II achieves higher throughput and better repeatability especially when measuring copper interconnect structures in very low-k and ultra-low-k ILD. These capabilities are enhanced by the addition of a reflectometer capable of measuring the thickness of these transparent ILD films and determining the reflectivity of antireflective coatings used in producing metal interconnect structures. The MetaPULSE uses picosecond ultrasonic laser sonar (PULSE Technology), a non-contact, non-destructive measurement technique based on laser-induced ultrasound. The system’s broad range of capabilities allows it to significantly reduce use of monitor wafers in controlling cluster tool MLM deposition. This can lead to very substantial cost and time savings.
MetaPULSE-III 300™ On-product Metrology for 45 nm Processes and Below With Low Cost of Ownership
Rudolph Technologies, Inc. has the MetaPULSEIII 300™ to meet semiconductor manufacturers’metal thin-film metrology requirements at the 45 nm technology node and beyond. The MetaPULSE-III can lower cost of ownership by up to 40 percent over the previous-generation system with industry-leading production throughput of over 100 WPH. The modular design of the MetaPULSE-III offers the latest advances in Rudolph’s patented PULSE Technology, which has been deploy-ed in over 200 installations for production monitoring of aluminum and copper processes. In addition, since the Meta PULSEIII is built on the VANGUARD-II™ platform, it can be combined with other metrology technologies to characterize a wide range of advanced processes. Applications of the MetaPULSE-III include measurement and characterization of metal gates, elastic modulus, ultrathin films, advanced copper barriers, copper shunt, electroplated copper, copper CMP thickness and surface profile, advanced silicides, silicon on insulator, SiGe, thermal conductivity, and low-k dielectric adhesion. During process research and development, the metrology requirements for these and other advanced applications may evolve rapidly, requiring a metrology tool with a wide range of capabilities that can quickly generate results. The MetaPULSE-III modular platform has EASy™ expert system software capable of combining data from multiple technologies into fast, user-friendly results; and sophisticated applications support based on years of in-fab experience. As the process ramps to high-volume production, the MetaPULSE-III will offer the high throughput, industry-leading repeatability, and tool-to-tool matching required for 24/7 process control.
Rudolph Technologies, Inc.
Flanders, NJ
Tel: 1-952-259-1647
SGVacuus Optical Monitor
Scalar Technologies Ltd, a developer and manufacturer of non-contact, thin film thickness measurement instrumentation and systems, introduced theSG Vacuus, the newest addition to the Scalar family of products.SG Vacuus is an in situ broadband optical monitoring system that provides precise measurement and control capabilities for single and multilayer vacuum deposited coating applications.
Scalar Technologies Limited
Livingston, West Lothian, UK
Tel: +44 1506 414 806
Autoloader Option for FilmTek™ Thin-Film Metrology Systems
Scientific Computing International (SCI), a supplier of high-resolution thin-film metrology instruments, has introduced a wafer autoloader option available for table-top FilmTek™ metrology models. The autoloader is a cost effective option to increase instrument throughput and automation while avoiding the price and complexity of a fully automated, stand-alone system. With a small footprint, the FilmTek autoloader has a load/unload cycle time on the order of a few seconds and dramatically increases wafer throughput for economical table-top instruments. The FilmTek autoloader option is available for 4 to 8 inch wafer sizes and is compatible with all tabletop FilmTek instruments.
Cost Effective Solution for Optical CD/Thin-Film Metrology
Scientific Computing International FilmTek™ CD is a costeffective solution for non-destructive optical CD and thin-film metrology applications. FilmTek CD accurately and simultaneously determines top and bottom line width, sidewall angle, and trench depth, in addition to film thickness and index. Based on normal incidence ellipsometry, FilmTek CD provides highly accurate measurements with fast data acquisition times. FilmTek CD includes proprietary diffraction software with fast, real-time optimization. An industry first, SCI’s real-time optimization allows the user to easily measure unknown structures with minimal setup time and recipe development while avoiding the time and complexity associated with library generation. FilmTek CD provides detailed profile information (including negative slopes) for gate and shallow trench isolation (STI) structures, as well as contact holes, vias, and deep isolation trenches. FilmTek CD can also measure depth for a single trench structure. The normal incidence ellipsometric design makes FilmTek CD ideally suited for the extremely small linewidths encountered at the 45nm and 32nm technology nodes. Available as an economical bench-top unit or as a fully automated stand-alone system with cassette-tocassette wafer handling, FilmTek CD can be configured to suit a wide range of budgets and end-use applications.
FilmTek™ 4000EM-DUV 300mm Optical Thin-Film Metrology System for Advanced Thin Films
The Scientific Computing International FilmTek™ 4000EMDUV leverages the combination of proprietary Multi-Angle Differential Polarimetry (MADP) technology with SCI’s patented Differential Power Spectral Density (DPSD) technology to provide an optical thin-film metrology tool with the best resolution, accuracy, and repeatability in the industry. By providing superior precision and accuracy, FilmTek™ 4000EM-DUV enables tighter thin-film process control during production of the latestgeneration IC’s to increase overall device yield and performance. In addition to providing tighter thin-film process control, FilmTek 4000EM-DUV enables chip manufacturers to accelerate their transition to future technology nodes through characterization and accurate measurement of advanced thin films. Manufacturing advanced IC devices at sub-130nm design rules requires the use of complex films that must be highly uniform. To maintain tight control over the processes used to build these films requires metrology systems that can monitor extremely thin films that are often within a multi-layer film stack (e.g., high-k and oxide-nitride-oxide films). Additionally, some processes result in gradients through the thickness of the film that must be monitored for optimum device performance (e.g., implant damage and low-k films). Existing metrology tools that rely on conventional ellipsometry or reflectometry techniques are limited in their ability to detect film changes for these applications. The FilmTek 4000EM-DUV enables high-precision thickness and material characterization measurements for accurately monitoring advanced thin films such as high-k film stacks, oxide-nitride-oxide (ONO), low-k films, 193nm photoresist, 193nm anti-reflective coatings (ARC and BARC), thick and thin silicon-on-insulator (SOI), silicon germanium (SiGe), and amorphous carbon films. In addition to measuring film thickness and index of refraction, the FilmTek 4000EM-DUV can simultaneously determine extinction coefficients, surface roughness and damage, porosity, crystallinity, birefringence and stress, and energy band gap.
Scientific Computing International
Carlsbad, CA
Tel: 1-760-634-3822
Xenith 1200 Series In-Fab System Metrology Tool
The Technos International Xenith 1200 series is a metrology tool designed to quickly and accurately measure thin films. It is designed to address industry needs at the 90nm node and beyond. The Xenith will handle with ease and precision single and multi layer stacks and next generation ultra thin films to 5Å. The Xenith offers advanced capabilities that meet thin film process control requirements. The parameters that can be measured by the Xenith are layer thickness and composition. Applications include process development and control of ultra thin ALD barrier and high-k films, rapid measurement of thick Cu, SiGe, metal silicides and Al metallization. The Xenith is designed for use in either the fab or lab and possesses the ability to bring thin film materials successfully from development to production. Fab friendly software, full automation and low COO make this tool the popular for today's and tomorrow's metrology needs.
S-MAT 2000 Metrology Tool
The S-MAT 2000 is the evolution of the S-MAT 200. This tool offers greater automation, S2/S8 and CE certification and enormous flexibility is configuring a tool to address 200mm production needs. The S-MAT 2000 is a metrology tool designed to accurately measure thin films, without standards. Advanced x-ray reflectivity (XRR) measure single- and multi-layers stacks with ease and a repeatability of 0.1%. Designed as a daily monitor the SMAT 2000 can rapidly and reliably handle 200mm production requirements. Measure thickness and density of metal films (Ti, Cr, Al, Co, Pt, Cu, Ir and others), measure Nitride films (TiN (PVD or MOCVD and organic CVD), SiN, WN, and others), measure Oxide Films (SiO2 , PZT, IrO2 and others), measure Silicide Films (WSi, TiSi2 , and others) and measure Multilayer Stacks: (Ti/TiN, SOI). The S-MAT 2000 is a cost effective solution with low CoO, fab friendly software, and 200mm automation. It's a great solution for pilot lines, or trailing edge fabrication.
Technos International
Tempe, AZ
Tel: 1-866-832-4666
High Resolution Film Thickness Analysis
Manufacturers have long relied on Wyko Optical Profilers for accurate, non-contact, 3D surface topography and film thickness measurements. software extends the utility of these tools for measuring the thickness of transparent and semi-transparent films as well. Wyko Vision® analysis software, included with all Wyko Optical Profilers, measures interference from both the substrate and the top of a transparent film, to characterize thickness up to over 100 microns. The Film Thickness analysis option adds the ability to measure through semi-transparent resists, coatings and other films, for accurate and repeatable thickness measurement without a step to the substrate. Unlike other thickness instruments, Wyko Optical Profilers characterize a wide surface area in a single measurement, highlighting local variations and defects that other systems do not identify. The topography of the upper and lower film surfaces is automatically determined as well, highlighting the coating’s effect on surface quality. With a unique combination of speed, accuracy, range and repeatability, Wyko Optical Profilers provide comprehensive, detailed film metrology data for process development and control.
New Dektak 150+ Surface Profiler: Industry-Best 4-Angstrom Step Height Measurement Repeatability
Veeco Instruments Inc.’s Dektak® 150+ Surface Profiler delivers increased resolution for measuring thin films to 10 nanometers and higher to meet the evolving requirements of today's deposition and etch applications. Veeco has been a leader in film process control for over 40 years The Dektak is a superb tool to monitor thin films as well as critical surface roughness, which is key for optimal process control. The new robust design of the Dektak 150+ incorporates a cast-aluminum frame and several vibration and noise reduction features to provide the lowest possible noise floor for measuring extremely thin films. In addition, the Dektak 150+ is able to measure thin film stress with longer scan lengths up to 55 millimeters and a larger vertical range up to 1 millimeter. The thin film stress measurement software automatically calculates compressive or tensile stress. The Dektak 150+ offers 3D imaging capabilities to map a user-defined surface area to perform in-depth analysis of surface defects and area roughness with Veeco’s exclusive Vision® 3D analysis software.
Veeco Instruments Inc.
Woodbury, NY
www.veeco.com
Contact: Fran Brennen, Senior Director of Marketing Communications
Tel: 1-516-677-0200 Ext. 1222 bb
E-mail: fbrennen@veeco.com
Vacuum Pump Equipment Suppliers
Compiled by Terrence Thompson, Contributing Editor
This vacuum pump product showcase covers the wide variety of roughing pumps, high-vacuum pumps, very-high-vacuum pumps as well as vacuum pumps used in R&D applications.
The most cost-effective and practical means of achieving the desired vacuum, in most applications, is achieved by doing it in stages. Roughing/backing pumps provide that crucial first stage in a wide range of configurations. This is followed by using high-vacuum, very-high-vacuum or ultra-high vacuum pumps to achieve the end result low pressure environment. Although this sounds straightforward, getting there involves many options and choices. Current generation pumps now span much wider ranges than those of just a years ago..
Vacuum pumps remove undesired specific gases, liquids and other contaminants, from a chamber in which a very low pressure exists, i.e., a vacuum. A vacuum could be simply defined as a volume of space that contains fewer atoms than a similar volume under normal atmospheric pressure. As you will see when perusing the product descriptions, pump manufacturers have some clever options that will make you look more closely at what is available and at what price to match your intended application.
Product Descriptions
In the following product descriptions, vendors make subtle but significant distinctions to focus on specific intended applications so direct comparisons may be difficult. When in doubt, go to Vacuum Technology & Coating magazine’s home page at and click on the advertiser links for additional details or telephone numbers for calling to discuss your specific application requirements.
ATP Series Turbomolecular Pumps (Very High Vacuum Pumps and R&D Applications)
The Alcatel ATP turbomolecular pump line is a wellestablished product known for its reliability. The ATP turbomolecular series of pumps incorporate a robust machined rotor and stator, large conductance for faster pumpdown time, grease lubricated bearings — allowing the pumps to be operated in any orientation, low rotational speed — providing increased resistance to air inrush and are field maintainable! Pumps are available in pumping speeds ranging from 80 to 900 L/s and standard, corrosive and high-pressure corrosive versions. www.adixen-usa.com
Maglev Hybrid Turbomolecular Pumps (High Vacuum Pumps)
The ATH-M series of Alcatel pumps are magnetically levitated. There is no mechanical contact, no friction and no wear resulting in no scheduled bearing maintenance and reduced cost of ownership. The pumps are actively controlled, real time, in five axes through an automatic balancing system. The pumps are designed for high throughput at high inlet pressure, are resistant against powder and provide a built-in purge to prevent deposition build-up inside the pumps. Additionally, no batteries are required because the motor acts as a generator in the event of a power failure. Pumps are available in pumping speeds ranging from 400 to 2100 L/s and heated or nonheated versions. www.adixen-usa.com
Turbomolecular Pumping Systems for Very High Vacuum Pumps and R&D Applications
The Alcatel turbomolecular pumping systems provide a flexible design providing a wide range of configurations. Systems are designed for installation on a workbench or below a vacuum chamber and offer optional casters to allow for easy movement. Turbopumps are available in pumping speeds ranging from 80 to 400 L/s, backing pumps are available wet from 5 to 21 m3 /hour or a 34 m3 /hour dry pump. Plus, numerous vacuum options such as turbopump vent valves, rotary vane pump isolation valves and integrated gauges are available. www.adixen-usa.com
Drytel Dry Pumping Systems for High Vacuum Pumps and R&D Applications
The Alcatel Drytel series dry pumping systems provide a compact, portable, reliable dry design. Systems provide one switch operation from atmosphere to 10-8 mbar. The secondary pumps are available in 7.5 or 30 L/s pumping speeds, diaphragm backing pumps are available in 1 or 4 m3 /hr. Options include an interface board allowing remote start/ stop, automatic gas ballast to improve the pumping of light gases and reduction of condensation, an exhaust connection and chemical versions. The unique, modern, open design allows for easy maintenance when replacing the membranes that have a 10,000 hour MTBPM. www.adixen-usa.com
ATH Series Hybrid Turbomolecular Pumps for Very High Vacuum Pumps and R&D Applications
The Alcatel ATH Series hybrid turbomolecular pumps incorporate grease lubricated ceramic ball bearings making them mountable in any orientation, low rotational speed providing increased resistance to air inrush and range in pumping speeds from 30 to 300 L/s. Outstanding compression ratios enable these pumps to reach 10-10 mbar ultimate pressure with backing pressures up to 45 mbar. These pumps are available in standard, interstage port and corrosive versions, with either water or air cooling, as well as nude versions that may be inserted directly into your instrument — improving performance, decreasing the system size and providing cost savings. www.adixen-usa.com
Molecular Drag Pumps for High Vacuum Pumps and R&D Applications
The extremely reliable Alcatel MDP Series molecular drag pump incorporates grease lubricated ceramic ball bearings making them mountable in any orientation. These pumps offer an ideal pumping solution between turbo and roots pumps with 7.5 L/s pumping speed, an ultimate pressure of 10-5 mbar and a maximum flow rate of 400 sccm. The pump molecular drag stages allow an exhaust pressure up to 40 mbar! Low rotational speeds and the mechanical design make this pump robust against accidental air in-rush, shock venting and gyroscopic effects. The MDP is available in standard and corrosive versions.
AdixenTM by Alcatel Vacuum Technology
Hingham, MA
www.adixen-usa.com
Tel: 1-781-331-4200
E-mail: inquiry@adixen-usa.com
EXT406PX Turbo Pump For Compact, Efficient Vacuum Systems
Edwards EXT406PX turbomolecular vacuum pump allows users to build cost-effective, compact vacuum systems, capable of withstanding high backing pressures even with continuous gas loads at the main inlet, and not just at ultimate vacuum. This new pump has been developed for use in combination with a backing pump of significantly smaller capacity, resulting in a vacuum system that consumes less power than comparable systems. This leads to a lower purchase cost, lower cost of ownership and re- duced carbon footprint. This is said to be the first pump of its kind that combines turbomolecular and drag stages with an innovative fluid dynamic stage, allowing users to achieve the same gas flow using a smaller backing pump. It offers reliable, high-speed, low-pressure performance and is available in two ranges. The ISO and CF 160 have Nitrogen (N2 ) pumping speeds of 400l/s (N2 ) and the ISO and CF 100 have N2 pumping speeds of 310l/s (340l/s for He). It can sustain normal operation at a backing pressure of up to 17mbar. The pump also features an optional inlet port, which, when correctly employed, can offer additional steady-state pumping speeds up to 24m3 /hr-1 at a pressure up to 4mbar. www.edwardsvacuum.com
STP iX2205 TM Turbomolecular Vacuum Pump
Edwards STP iX2205 TM series of magnetic bearing turbo vacuum pumps is used on architectural glass coating machines, small scale industrial coating applications and in the manufacture of solar cells. Providing industry-leading performance, the pumps feature power supply and control modules that can be mounted in various configurations; directly on the pump, or remotely. This eliminates cables and accessory racks and gives the units the flexibility to fit a wide range of equipment. The STP iX2205™ range works in high ambient temperatures, where external condensation on cooling can be an issue and they are IP54 rated for protection against water and dust. The STP iX2205 is available with RS232, RS485 & Profibus serial communication interfaces. Currently available in 1600 l/s and 2200 l/s versions with larger units are planned for future development. The pump’s five-axis magnetic bearing system and new motor and drive system ensure long life and low operating costs with maintenance intervals up to five years, depending on usage. All turbo pumps can be connected to Edwards' advanced monitoring system that tracks and logs key parameters to give advanced notification of when a service is required. www.edwardsvacuum.com
Two Stage Rotary Vane Vacuum Pump
The Edwards RV range of dual mode vacuum pumps, are designed for applications that require either high throughputs or high ultimate vacuum. These pumps can be configured by the user to obtain optimum pumping performance without compromising the application, offering a high ultimate vacuum down to 2 × 10-3 mbar in high vacuum mode and 3 ×10- 2 mbar in high throughput mode. Now available with ATEX approved (flame proof) motors, which have been developed in response to increasing customer demand, allowing operators to comply with the European ATEX Directive. These pumps can operate in a place in which an explosive atmosphere consisting of a mixture with air of dangerous substances in the form of gas, vapour or mist is not likely to occur in normal operation but, if it does occur, can do so occasionally. In high vacuum mode, the RV pumps are ideal for analytical instruments, electron microscopes, physics research, backing turbo pumps, TV tube pumping and leak detection applications. In the high throughput mode, they are suitable for distillation, laboratory furnaces, backing vapour pumps, solvent concentration, freeze drying and other drying applications. www.edwardsvacuum.com
CPH Chemical Dry Vacuum Pump
Industry is under increased pressure to save space on the plant floor and Edwards CPH™ chemical dry pump series are a cost competitive and simple solution, ideal for use in chemical and pharmaceutical applications. They are fully ATEX compliant and users can reliably pump a wide range of flammable vapours. There are two new pumps in the range, the CPH250 chemical dry pump, with a 250m3 /hr throughput, and the CPH400 chemical dry pump, with a 400m3 /hr capacity. Both offer excellent pumping speeds from atmospheric pressure down to an ultimate pressure of less than 0.5mbar. They are also available as pre-engineered pump and booster combinations with Edwards popular EH range of mechanical boosters to give a compact package with pumping speeds up to 2,700m3 /hr and a low ultimate pressure which is well suited to applications such as solvent drying. The CPH chemical dry pump series builds on Edwards long history of developing innovative dry pumping solutions, and the experience gained from having over 100,000 pumps installed worldwide. www.edwardsvacuum.com
XDS Scroll Pumps
Edwards XDS Scroll pumps are an alternative to rotary vane pumps where oil free pumping is desirable. The innovative new XDS pumps use a patented bearing shield to isolate the vacuum environment from all forms of lubricant not only making them totally dry, but also protecting the bearing from any process gases. Vapor handling is enabled by an adjustable gas ballast; this allows the range of pumps to satisfy many applications that were previously off limits to scroll pumps. Avail- able in three sizes, XDS5, XDS10 and XDS35i up to 35m³h- ¹, their ability to work equally effectively in laboratory or industrial environments make the XDS scroll pumps the first choice in a wide range of applications.
Edwards Vacuum
Wilmington, MA
www.edwardsvacuum.com
Tel: 1-800-848-9800
E-mail: info@edwardsvacuum.com
BLDC Diaphragm Pump Features High Suction Speed in Low Vacuum
KNF's latest oil-free diaphragm pump, the Model N940.5APP features excellent suction speed at low absolute pressures in a compact, 4-stage package. A series of technical innovations include a diaphragm stabilization system, adjustable flow rate via potentiometer or external controller, and multiplevoltage power capability. Rated at 50 LPM freeflow, it can achieve 1.5 mbar absolute end vacuum, with exceptional flow at lower pressures. This pump is very quiet and cool running, utilizing either an IP-54 AC motor, or an efficient brushless DC motor that features remote speed control capability. This allows instrumentation to determine pump performance based on demand or other criterion. A high level of gas-tightness is achieved, approximately 6 × 10-3 mbar x L/s. Typical applications are in the fields of analytical chemistry, medicine and production technologies. The N940 also supports turbomolecular systems as roughing pumps.
Brushless DC Diaphragm Pump Features Controllable Performance
KNF’s oil-free diaphragm pump Model N814 is designed for vacuum or pressure requirements. Combining KNF's structured diaphragm and multi-port liquid-tolerant valves with an efficient brushless DC motor, the resulting package is lightweight and 25% smaller than existing units. The BLDC controller features remote speed control that allows an instrument's logic circuits to determine pump performance. The BLDC motor is compact, eliminates EMI/RFI, and has no brushes to wear, making it ideal for portable applications. This smooth-running pump provides 12 L/min. flowrate, achieves 23-inches Hg (180 Torr) or 30 psig pressure. Chemical resistant versions, other flowrates and motor types are available. They are ideal for portable medical instruments, analyzers or wherever performance and low-maintenance is required.
KNF Neuberger, Inc.
Trenton, NJ
Tel: 1-609-890-8600
Scroll Pumps
The Kurt J. Lesker Company’s Ultimate Vacuum Series (ULVAC) of Dry Scroll vacuum pumps require no sealing fluid or lubricant thereby providing a completely oil-free pumping environment. The innovative “double wrap” scroll design ensures that the pump occupies minimal space while providing a dynamically stable, low vibration and low noise solution. Overall pump performance, maintenance interval, and particulate and water vapor handling capability are remarkably improved by the use of the ballast device and unique shaft seal system. These features are standard on each pump. The Kurt J. Lesker Company offers single-stage (industrial versions for greater continuous inlet pressures and improved vapor handling) and two-stage (for improved ultimate pressures) models with pumping speeds from 3.8 cfm to 21.2 cfm and ultimate pressures as low as 7.5 milliTorr. www.lesker.com
Diaphragm Pumps
The Kurt J. Lesker Company’s Ultimate Vacuum Series (ULVAC) of Dry Diaphragm vacuum pumps is an extensive line of dry diaphragm pumping solutions. Models range from tiny OEM models designed for integration into a manufactured tool or system, to large industrial models perfect for vacuum chuck, packaging equipment, and other manufacturing and medical solutions. The minimal maintenance, high reliability, excellent ultimate vacuum and impressive pumping speeds make our diaphragm pumps the choice solution for many dry pumping applications. Our anti-corrosive Teflon series are perfect for corrosive or organic solvent applications and are often used to back turbomolecular pumps. With pumping speeds from 0.18 cfm up to 14 cfm and ultimate pressures as low as 2 Torr, we have the dry pump solution for you. www.lesker.com
Rotary Vane Pumps
The Kurt J. Lesker Company’s Ultimate Vacuum Series (ULVAC) of Rotary Vane vacuum pumps are superior, high performance, low vibration, and low noise oil-sealed rotary vane pumps. These pumps offer premium features such as gas ballast, forced-oil supply, anti-suckback device, and low temperature operation at an economical price. Models range from pumping speeds of 1.7 cfm to 12 cfm and an ultimate pressure of 0.5 milliTorr. Equivalent corrosive-resistant designs for applications involving toxic or corrosive gases are available. Pump performance is impressive and these affordable pumps offer an excellent value for the vacuum user. www.lesker.com
LION™ Series Ion Pumps
The Kurt J. Lesker Company LION™ Series Ion Pumps are one of the most extensive ion pump offerings in the industry. Nineteen standard models range in size from 3 L/s through 800 L/s and include tall and low profile versions able to fit into just about any footprint. The standard Diode and Noble Diode elements are complemented by the Noble 30 option. The Noble 30 combines the lowcost benefits of a Diode pumping element with the noble gas capabilities of the Noble Diode. Three controllers complete the offering with RS232 as standard and the ability to control up to four pumps simultaneously at no additional cost. The KJLC pumps and controllers can even be configured to be compatible with Varian ion pumps. www.lesker.com
212, 412, 615, and 1722 Stokes Replacement Series of Pumps
The Kurt J. Lesker Company's 212, 412, 615, and 1722 Stokes Replacement Series of pumps offer the performance and reliability of their Stokes® counterparts, but at a fraction of the cost. The 615 blower and 1722 booster package feature as standard a bypass valve that permits the booster to start at atmosphere. Even the internal parts are drop-in replacements and equivalents for the Stokes pumps. The performance and quality of these pumps allow KJLC to back them with a 2-year warranty.
Kurt J. Lesker Company
Clairton, PA
www.lesker.com
Contact: Walt See, Product Manager
Tel: 1-412.387.9035 or 1-800-245-1656
E-mail: walts@lesker.com
High Vacuum Diffusion Vacuum Pumps
Oerlikon Leybold Vacuum DIP Diffusion Pumps are the successors to the highly-reliable DI Diffusion Pump line. Available in pumping speeds ranging from 3,000 to 50,000 L/sec with possible end vacuum to 0.75 × 10-8 Torr, these diffusion pumps have been successfully installed in applications such as heat treatment / metallurgy, industrial coating and space simulations. When combined with our fore-vacuum pumps, boosters, gauging, hardware, valves and electrical controls, Oerlikon Leybold Vacuum can provide a total high vacuum system solution.
Dry Compressing Screw Vacuum Pump
The Oerlikon Leybold Vacuum ScrewLine® series of oil-free compression screw-type vacuum pumps meet the special needs of industrial applications. ScrewLine SP 250 and SP 630 are an alternative to all oil sealed vacuum systems. Typical areas of application include heat treatments/metallurgy, industrial coating technology, packaging, drying and space simulations. ScrewLine features include an environment friendly vacuum pump that does not produce any contaminated waste oil or water, extended maintenance intervals and a significant cost of ownership savings compared to oilsealed vacuum pumps. With an ultimate pressure and speed of 3.8 × 10-3 Torr and 195 cfm for SP250 and 7.5 × 10-3 Torr and 371 cfm for SP630, these vacuum pumps may be close coupled with our RUVAC® boosters where increased pumping speed is desired in multiple oil-free compression vacuum stages.
Turbomolecular Pumps - MAG
Oerlikon Leybold Vacuum’s line of Turbomolecular pumps with magnetically levitated rotors are known as the MAG.DIGITAL line. The MAG.DIGITAL line provides superior vacuum performance with models ranging in pumping speed from 830 L/sec to 3200 L/sec. The MAG.DIGITAL line has been optimized to meet the vigorous requirements of the semiconductor industry, but is also commonly used in analytical, R&D, industrial coating and any UHV application where pressures from 10-1 to 10-9 Torr is required. The main features of the MAG.DIGITAL line are 5-years of maintenance-free continuous operation, very low vibration, high strength rotors in two versions (classic turbine or compound design), corrosion proof coating on the rotors, automatic balancing, integrated temperature management system, purge gas valves and many more innovative features. The rugged design built into the MAG.DIGITAL line with can withstand typical accidents and events that can occur in industrial environments such as shock venting, emergency shut-downs and other external shocks. All MAG.DIGITAL pumps are operated from one fully programmable MAG.DRIVE digital controller.
Single Stage Rotary Vane Vacuum Pumps
The Oerlikon Leybold Vacuum Sogevac® series rotary vane vacuum pumps meet the requirements of general industrial vacuum applications where pumping speeds of between 11 cfm to 677 cfm and ultimate pressures up to 6 × 10-2 Torr are sufficient. Typical application areas include: central vacuum for industrial plants, industrial coating, heat treatments, leak detection, packaging and other general degassing applications. Sogevac features include continuous duty operation with an automatic oil re-circulation system/integral exhaust separation, multi-voltage dual-frequency motors, air cooling, standard anti-suckback protection valve to protect against oil migration, low vibration and simplified maintenance.
Rotary Lobe Vacuum Boosters
RUVAC® vacuum boosters have been manufactured by Oerlikon Leybold Vacuum for decades. The dry compressor Roots principle has proven itself in many areas of vacuum technology. Combined with oilsealed vacuum pumps such as the TRIVAC® or SOGEVAC® , RUVAC vacuum boosters are used to increase the pumping speed at low pressures, thus extending the operating speed and pressure range of the vacuum system. Additionally, RUVAC may be combined with our oil-free compression ScrewLine® vacuum pumps where oil-free compression is desired in multiple vacuum stages. RUVAC vacuum boosters are manufactured in two series, both air cooled, but with different motor drives. The RUVAC WA series uses a flangemounted standard three-phase motor; the RUVAC WS series has a canned (rotor) motor. Each series has of four different boosters covering carefully selected pumping speeds and are available with or without integrated bypass valve. RUVAC is used in almost all areas of vacuum technology and have been developed in such a way that the most diverse spectrum of requirements can be met.
Dual Stage Rotary Vane Vacuum Pump
Oerlikon Leybold Vacuum TRIVAC® series two-stage vacuum pumps consists of six basic models (D4/8/16/25/40/65B) which provide pumping speeds from 3 cfm to 53 cfm, with inlet pressures from atmospheric to an ultimate pressure of 0.75 × 10- 4 Torr. A forced-feed oil system lubricates and seals the vanes and internal parts. Direct drive motors provide quiet and smooth operation. KF inlet and outlet ports can be quickly changed between vertical and horizontal orientations. All seals are Viton.An internal anti-suckback valve seals the pump inlet when the pump stops, thus protecting the customer process. The TRIVAC line of fore-vacuum pumps is considered the industrial standard providing years of continuous duty operation in many diverse applications.
Cryogenic Vacuum Diffusion Vacuum Pumps
Oerlikon Leybold Vacuum Coolvac® Cryogenic Vacuum Pumps are available in models ranging 800 to 60,000 L/sec pumping speeds and from 0.75 × 10-3 to 0.75 × 10-11 Torr vacuum. These gas entrapment vacuum pumps offer hydrocarbon-free vacuum pumping for use in R&D applications, Industrial Coating, Space Simulations and other applications where large-volume evacuation into the ultra-high vacuum range is desired. Combined with our forevacuum pumps, boosters, gauging, hardware, valves and electrical controls, Oerlikon Leybold Vacuum can provide a total ultra-high vacuum system solution.
Oerlikon Leybold Vacuum
Export, PA
Contact: Mario Vitale, Regional Market Manager—Process Industry
Tel: 1-724-325-6565
E-mail: mario.vitale@oerlikon.com
High-Speed HiPace™ Turbopumps for High Performance And Reliability
Pfeiffer Vacuum has expanded its line of fast and powerful HiPace™ turbopumps. Available in pumping speeds that range from 1000 to 2000 liters/second, HiPace features a new rotor design that reduces run-up time by 50% and provides high gas throughput for light (H2, He) and heavy gases (Ar, CF4). The use of aluminum housing and innovative materials makes this turbopump 40% lighter in weight and doubles the service life to five years between bearing changes. Integrated drive electronics reduces the need for bulky and costly cabling. A variety of communications protocols, including Profibus and DeviceNet are available without any increase in physical size. The advanced rotor design and precise sensor technology of the HiPace turbopumps offer what is said to be the highest level of safety in the market, including IP54 and SEMI S2 protection classes. HiPace is available in both standard and corrosive models, which makes them ideal for use in semiconductor applications where particulate contamination, high gas loads and corrosive gases are common. In addition, HiPace is suitable for photovoltaic coating, industrial applications such as brazing furnaces, general sputter coating, and coating of architectural glass and ophthalmic lenses. www.pfeiffer-vacuum.com
PentaLine•— The New Shape In Rotary Vane Pumps
PentaLine• rotary vane pumps from Pfeiffer Vacuum, with a new optimized drive system, provides cost effective, environmentally friendly vacuum, for a wide range of applications in the low and medium vacuum range down to 10-3 mbar. Available in pumping speeds up to 35 m3 /h, PentaLine is hermetically sealed for leakfree vacuum, and provides compatible voltage for worldwide use. It’s standby operating mode provides a power savings that can reduce operating costs up to 50% and assures a longer service life. PentaLine rotary vane pumps run noiselessly with minimum vibration assuring a cooler, quieter work environment. Contact: www.pfeiffer-vacuum.com
HiPace™ Turbopumps Delivering Vacuum Faster From 10 to 700 l/s
HiPace• turbopumps feature a new rotor design, providing reduced run-up time, higher gas throughput and exceptional compression for light gases. A variety of drive versions, including Profibus and DeviceNet, are available without an increase in package size. The compact HiPace has integrated drive electronics, which reduces bulky and costly cabling. Innovative materials have doubled drive service life, while a proven Pfeiffer Vacuum bearing design ensures reliability, even in harsh applications. Available in pumping speeds from 10 to 700 l/s, HiPace can be installed in any orientation. Contact: www.pfeiffer-vacuum.com
$5495 Dry Turbo Pumping Station
The Pfeiffer Vacuum E-Station is a complete dry turbomolecular vacuum pump station for $5495. This plug and play vacuum station includes a turbo and dry diaphragm pump and RS485 display unit and is available with Conflat or ISO flange sizes. The E-Station is well suited for R&D and vacuum applications that require hydrocarbon-free vacuum. Pfeiffer Vacuum’s bench-top E-Station has a high pumping speed of 60 l/s and an ultimate pressure of <10-8 mbar. The pump is always in stock. Information: www.pfeiffer-vacuum.com
CombiLine• Roots Pumping Stations
CombiLine• pumping stations are a combination of a Roots pump or pumps and the following major components: rotary vane, turbo, dry, liquid ring, cryo and/or diffusion pumps. They can also include gauges, analytical equipment and control systems, depending on application. Pfeiffer Vacuum has over 40 years of experience in building standard and customer-specific pumping stations. The standard CombiLine pumping stations include: CombiLine Roots pumping stations with the single-stage or two-stage rotary vane pumps are designed for applications that require ultimate pressure of up to 3 × 10-4 mbar such as metallurgy, helium leak detection and electron beam welding. CombiLine Roots pumping station with the dry vacuum pumping are ideal for applications that require ultimate pressure of up to 5 × 10-3 mbar including coating, metallurgy, degassing plastics and vacuum drying. This series of pumping stations are dry and oil-free for contamination-sensitive processes. Pfeiffer Vacuum builds customer-specific pumping stations for applications that necessitate high pumping speeds and/or ultimate pressures of < 10-3 mbar. Contact: www.pfeiffer-vacuum.com
XtraDry• Dry Vacuum Pump for Clean and Reliable Vacuum
The Pfeiffer Vacuum XtraDry• dry vacuum pump is designed for all medium vacuum applications down to 10-1 mbar where there is a need to pump dry, inert and non-reactive gases. Operated as either a stand-alone or backing pump, XtraDry operates free of hydrocarbons and particulate matter which prevents contamination of the process or the environment. XtraDry has been designed for exceptional performance, long service life, ease of maintenance and low cost. A unique seal design prevents gas backstreaming within the pumping system, enabling gases to be pumped regardless of their molecular weight. An automatic standby mode reduces the speed of the pump by more than 30% during operation near ultimate pressure, saving energy and increasing service life.
Pfeiffer Vacuum, Inc.
Nashua, NH
www.pfeiffer-vacuum.com
Tel: 1-800-248-8254
E-Mail: contact@pfeiffer-vacuum.com
Marathon® CP Cryopumps
The Sumitomo (SHI) Cryogenics Marathon® CP Cryopumps are an expanding product line available in multiple flange styles, sizes and configurations. With a powerful refrigerator, Marathon CP typically out-performs other cryopumps of the same physical size. Its innovative design assures that users achieve the highest performance possible, while keeping it competitively priced. The CP-20 can be driven by the new, high-efficiency F-70 compressor. Like all Freedom® series compressors, the F-70 provides refined oil and gas management to the cryopump and offers a unique 30,000-hour service interval. Additionally, the optional Marathon Cryopump Controller (MCC) enables fully automatic operation of the cryopump using commands from a host computer using standard cryopump protocol. The result is greatly reduced downtime between production cycles, improved process times and better overall efficiency of the user’s process. The CP-20’s compact and robust design fits easily onto new and existing systems. It can be readily maintained without breaking vacuum or removing the cryopump from the chamber for return or replacement. Like all SHI Cryogenics Group products, it is supported by a worldwide sales and support network. Its easy serviceability maximizes production uptime and lowers the total cost of ownership. www.shicryogenics.com
SICERA™ Cryopump
At only 0.9kW per pump, Sumitomo (SHI) Cryogenics recently introduced the SICERA™ cryopump boasts extremely low energy consumption compared with other vacuum products currently available for semiconductor, flat panel display and related processing. The breakthrough multipump system allows up to six 8-inch pumps to run on a single compressor without performance degradation, making it ideal for high-volume semiconductor wafer manufacturing. The complete SICERA cryopump system includes a compressor and remote controller, which have been thoroughly tested to withstand the most demanding vacuum applications. Through continuous control of both the cryocooler and compressor, SHI Cryogenics Group is able to offer a reliable cryopump system with solid performance and temperature and vacuum stability.
Sumitomo (SHI) Cryogenics of America, Inc.
Allentown, PA
www.shicryogenics.com
Tel: 1-610-791-6700
E-mail: sales@shicryogenics.com
EC Series Dual Stage Rotary Vane Pumps
ULVAC’s EC Series of dual stage oil rotary vacuum pump with direct-drive motors are designed for use in a broad range of applications including CVD, etching, solar cells, as well as vacuum coating. These lightweight compact pumps feature low noise with minimal vibration levels. This ULVAC pump has excellent corrosion resistance. The EC series is available in pumping speeds from 800 (l/min) [48 m3 /hr] to 1600 (l/min) [96 m3 /hr] with an ultimate pressure of 0.67 Pa. www.ulvac.com
Turbo Molecular Pumps
ULVAC’s Magnetic Levitation and Digital Control Turbo Pump Series are designed for a broad range of applications including solar cell, PVD, OLED, as well as R&D and laboratory environments. The turbo molecular pump series features high function, high reliability, energy saving performance and improvement of compression ratio for hydrogen, etc. The UTM-FW series are ideal pumps for middle • hard processes with high gas loads. The UTM-FH series are ideal pumps for light • middle processes. The UTM-FW/FH Series is available in pumping speeds from 350 (l/sec) to 6300 (l/sec). www.ulvac.com
Large Rotary Piston Vacuum Pumps
ULVAC’s PKS Series of large oil rotary piston vacuum pumps are extremely durable with very stable pumping evacuation characteristics. They currently are used in applications ranging from metal and automotive to chemical, pharmaceutical and food industries. These single stage pumps are designed with high-grade cast metal, which provides excellent corrosion and abrasion resistance. The PKS Series is available in pumping speeds from 96 to 420 m3/h and a final pressure of 2.7 Pa. Disassembly and reassembly for maintenance and exhaust valve inspection is extremely easy. www.ulvac.com
YM Mechanical Booster Pumps
ULVAC’sYM Series of mechanical booster pump units contain an oil-sealed rotary vacuum pump and a mechanical booster pump on compact platforms with connection piping and control panels. These pumps are used in a wide variety of applications including: evaporation, sputtering, and ion plating; vacuum packing, transport, and casting; vacuum furnaces, sintering furnaces, and blazing furnaces; vacuum drying, freeze drying, and air removal; gas substitution/supply, vacuum insulation and leak test equipment. The YM mechanical booster pumps are available in pumping speeds of 95 to 1000 m3/h with an ultimate pressure of 0.4 Pa.
ULVAC Technologies, Inc.
Methuen, MA
www.ulvac.com
Tel: 1-978-686-7550
Oil Free Diaphragm Vacuum Pumps
Vacuubrand offers a wide range of modern oil free diaphragm pumps. These are often the best overall vacuum technology in the atmosphere to 0.3 Torr range and are outstanding as backing pumps for modern wide-range turbo pumps. The illustrated MD pumps are very compact 1.1 Torr, three stage, totally oil free mechanical pumps. The precision guided planar diaphragms and valves provide outstanding performance at low pressure with long term ultimate vacuum stability. Low vibration, low noise and exceptional diaphragm life, typically greater than 10,000 hours, characterize this new generation of pumps. Features include: continuous (24/7) oil free pumping, minimal and simple maintenance, flexible mounting in any position, available with 100 to 240V, 50/60 Hz or electronically controlled 24V motors.
Vacuubrand, Inc.
Essex, CT
www.vacuubrand.net
Contacts: Bob Freeman or Mike Conklin
Tel: 1-860-767-5341 or Toll Free: 1-888-882-6730
E-mail: vbrand@vacuubrand.net
Dry Vacuum Pumps
The Vacuum Research Corp. long life dry vacuum pumps can operate more than 2 years without maintenance or adjustment. These easy to rebuild pumps have been in production for 20 years and have proven their reliability in 24/7 operations around the world. Ultimate pressure is 20 milliTorr (2.6 Pa) and several models are available with capacities from 6 CFM to 16 CFM (10 to 28 m3 /hour). Single stage pumps are available for vacuum drying and solvent removal. Ultimate pressure for single stage is 700 mTorr (90 Pa). When used with turbo pumps customers often select the optional VRL Soft Start & Speed Control. This low cost option automatically slows the pump when gas loads are small and immediately increases speed if the pressure starts to rise. Other options such as explosion proof motors, and complete vacuum instrumentation and controls may be ordered. www.vacuumresearch.com
Smart Dry Pumps
Vacuum Research Corp’s Smart Dry Pump™ for roughing of ion or cryo pumps and backing of turbo pumps. Because the new Smart Pump™ switches piston operation from parallel for roughing to series operation for high vacuum; this new pump provides the proven reliability of our piston style pumps at 30 % lower cost per cubic foot of pumping speed and a 30% smaller footprint. Like all VRL Dry Pumps, the Smart Dry Pump™ needs no cooling water or purge gas, and of course, there is absolutely no oil or pump fluid to monitor or dispose of. The high capacity and low ultimate pressure of the smart pump is accomplished by operating the pistons in parallel from atmosphere to 1 Torr and then automatically switching them to series operation to give the 20 mTorr ultimate pressure. The crossover is controlled with a VRL Pirani gauge vacuum switch and even more savings can be accomplished with the VRL Soft Start & Speed Control added to your Smart Dry Pump.™ Smart Dry Pump™ is a trademark of Vacuum Research Ltd.
Vacuum Research Corporation
Pittsburgh, PA
www.vacuumresearch.com
Contact: John Hartnett
Tel: 1-800-426-9340 or 1-412-261-7630
E-mail: VRL@vacuumresearch.com
IDP-3 Dry Scroll Vacuum Pump
The Varian IDP-3 is a compact, high performance dry pump that provides affordable oil-free vacuum and easy system integration, and is suitable for a wide variety of applications. The IDP-3 employs an innovative hermetic design in which the motor and bearings are outside the vacuum space, allowing full isolation of all pumped gases. Delivering a robust pumping speed of 60 l/m and a very low base pressure of less than 250 milliTorr, the IDP-3 provides all the advantages of Varian’s patented scroll pump technology in a compact, lightweight, cost-effective package. www.varianinc.com
SH-110 Dry Scroll Roughing Pumps
Varian’s SH-110 Hermetic Single Scroll Pumps are designed to provide reliable, dry vacuum in a small, economical package. The pump is ideally suited for many applications including Analytical Instruments and Research and Development. This simple, reliable design utilizes proven TriScroll™ seal technology for longer demonstrated maintenance intervals. The SH-110 conforms to CE, UL/CUL, and SEMI S2-0200 requirements. www.varianinc.com
TriScroll Series Multi-Stage Dry Vacuum Pumps
Varian’s TriScroll™ dry primary pumps are multistage dry vacuum pumps designed and manufactured by Varian Inc. The pumps produce oil-free vacuum at high speed and low ultimate pressure. The unique, patented TriScroll design features proven reliability and durability resulting in superior cost of ownership and consistent performance. Key features include a unique and efficient TriScroll design, a bearing purge port and an automotive ballast port, www.varianinc.com
Frequency Inverter Driven TriScroll Pumps
The application of innovative frequency inverter technology to Varian’s TriScroll Dry Scroll Pumps provides several significant advantages over conventional vacuum pumps. Inverter driven TriScroll 300 and 600 pumps deliver optimal and consistent performance throughout the worldwide range of voltage and frequency conditions. Operating with low power requirements, the microprocessor-controlled frequency inverter is an efficient driving unit capable of delivering high starting torque and constant pump performance. www.varianinc.com
DS Series Rotary Vane Mechanical Pumps
Designed to meet the demanding requirements of industrial and scientific applications, Varian’s reliable DS Series ensure high pumping stability for light gases, low noise, minimal oil backstreaming, and long operating life. These pumps conform to CE requirements, and all pump motors are UL and CSA approved. Key features include: dual stages; auto suck back valve along with a built-in oil shield and gas ballast valve; forced oil circulation to ensure long life; and forced air ventilation for cooler operation. www.varianinc.com
Turbo-V Turbomolecular High-Vacuum Pumps
Varian, as part of its total vacuum solution, offers a complete line of turbomolecular pumps and controllers, with pumping capabilities ranging from 40 to 6,000 L/s nitrogen. These pumps are optimized for specific applications and are widely used in industrial production, semiconductor manufacturing, scientific instruments, and general UHV research. Performing at the highest speed/compression-ratio in the smallest envelope, they are truly maintenance-free, widerange pumps, capable of operating at higher foreline pressures than standard turbomolecular pumps. Varian offers further customization by providing multiinlet pumping systems that are compact and reliable. www.varianinc.com
Turbo-V 2K-G Series Pumps
Varian’s Turbo-V 2K-G is designed as an “application specific” pump for vacuum coating applications. The pump is optimized for high gas loads, with pump rotor and stators ruggedly designed to operate with high argon gas loads. The pump can also be installed at any orientation, eliminating design restrictions. The integrated system includes the turbo pump, controller, and universal power supply all as part of the pump, enabling simple hookup and eliminating controller rack space. Varian’s MoniTorr preventive maintenance diagnostic capabilities are available as options. www.varianinc.com
Turbo-V 3K-T System
The V 3K-T from Varian is a versatile 2000 L/s class turbo system offering the highest performance in a unique compact design, with innovative features including integrated electronics, real-time thermal overload protection and intelligent MoniTorr technology. Designed for demanding high gas load or light gas pumping and high compression UHV applications, the integrated package includes turbomolecular pump, drive electronics, power supply, MoniTorr technology and communication, and versatile electronics interface with easy-to-use T-Plus Software. www.varianinc.com
Diffusion Pumps
As a worldwide diffusion pump market leader, Varian produces the most comprehensive family of pumps ranging from 2 to 35 inches in diameter. Varian’s diffusion pumps are recognized as the industry standard and are known for high throughput, high pumping speeds, low ultimate pressure, and long service life. www.varianinc.com
Very-High-Vacuum Ion Pumps
Varian manufactures a family of ion pumps, controllers, options, and accessories designed to provide solutions for every application. To accommodate the extensive range of application requirements — such as operating pressure, the mixture of pumped gases, and maximum starting pressure — and to achieve the best performance for each, Varian offers a wide range of ion pump types and sizes. Varian’s VacIon Plus family includes Diode, Noble Diode, and StarCell® pumps and in order to provide a selection of power levels and interfaces, Varian also has complementary MiniVac, Dual, and MidiVac Ion Pump controllers.
Varian, Inc.
Lexington, MA
www.varianinc.com
Contact: Steve Palmer, Manager, Marketing and Merchandising, Vacuum Technologies, North America
Tel: 1-781-860-5426
E-mail: steve.palmer@varianinc.com
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