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Electron-Beam, Ion-Beam and Magnetron Deposition Sources
Compiled by Terrence Thompson, Contributing Editor
This annual product showcase covers new or improved electron-beam, ion-beam, magnetron and other deposition sources used in a wide variety of production, R&D and other applications.
Product Descriptions
In the following product descriptions, vendors make valid distinctions to focus on specific niche market segments so direct comparisons may be difficult. When in doubt, go to Vacuum Technology & Coating magazine’s home page at and click on the advertiser links for additional details or telephone numbers for calling to discuss your specific application requirements. With their experience, they can help you make the right choices.
1” UHV Magnetron Sputter Gun – Source Head Fits Through 2.75” CF Flange
Finally, a UHV, magnetron sputter source that  actually fits through the port of a 2.75” CF flange complete with its tilt gimbals assembly. Retrofitting UHV magnetron sputter sources into existing vacuum chambers can be difficult due to the availability and location of appropriate ports. With AJA International’s new A310-XP, one only needs a 2.75” CF (CF38) to accommodate the source head, tilt gimbals and gas injection/isolation chimney. The entire source can be extracted from the chamber without any disassembly. Target changes can be made with one hand either inside or outside of the chamber. This revolutionary new design is true UHV— all ceramic to metal construction. These sources can be combined into multi-gun clusters or be fitted with any sort of custom “goose necked” support tube to point at any spot in the chamber. The design is ideal for Surface Science chambers and anyone working with small substrates (up to 2” diameter). The A310-XP is suitable for RF and DC operation. www.ajaint.com
New CT1210 Hollow Cathode Cylindrical Magnetron Sputtering Source for Simultaneous 360 Deposition Applications
AJA International, Inc. has recently developed a  new 12” ID, 10” deep, hollow cathode magnetron sputtering source. This source is designed to coat three-dimensional substrates from all sides simultaneously and features an internal gas distribution system to optimize uniformity. Targets can be made from one piece or material can be plasma sprayed onto a stainless steel backing cylinder. Custom sizes of this type of source and versions with two open ends (allowing continuous substrates to be coated, e.g. fibers, wires or ribbons) are also offered. Sources are available in both DC and RF versions. www.ajaint.com
New A300-XP Series UHV Magnetrons with In-Situ Tilt for Exceptional Uniformity
AJA International, Inc. is building many UHV magnetron sputtering systems featuring the unique in-situ tilt design (patent pending) delivering +/- 1% film thickness uniformity over substrates twice the t a r g e t diameter. The incident angle of the deposited material can be e a s i l y adjusted and reset when the working distance is changed or when the sources are serviced in any way. The precision of this design approach lends itself perfectly to the deposition of ultra thin film multilayers and co-deposited alloy films used in combinatorial chemistry research. Sizes rage from 1” to 10” diameter. Substrate heaters, RF/DC power supplies, targets and custom engineering also available. www.ajaint.com
Stiletto Series Magnetrons Economical HV Magnetrons with Extensive Features
With its Stiletto Series, AJA International, Inc.   offers a wide range of economical, HV sputter magnetrons for R&D and production applications. Target sizes range from 1” to 12” diameter for circular magnetrons and from 1.5” × 6” to 6” × 40” rectangular magnetrons . These RF / DC compatible sources feature AJA’s unique modular magnet array, internal or external mounting options, source head tilting capability and integral process gas injection. Custom engineered solutions are easily facilitated by the Stiletto Series’ modular design. www.ajaint.com
Nautilus Series Rotating Magnetrons with Open Architecture Magnet Array
AJA International, Inc. has delivered over 100   Nautilus Series rotating magnetron sputter sources. The unique design of the Nautilus sources allows the magnet array to be precisely tuned to the application. This feature permits configuring the sources for maximum target utilization, maximum uniformity, intentional non-uniformity, balanced and unbalanced depositions, gradient depositions and varying stoichiometry for combinatorial chemistry studies. It is engineered for CD and DVD coatings and includes convenient process gas introduction and distribution. Custom engineered mounting and hinge solutions for target changing are readily available.
AJA International, Inc.
N. Scituate, MA
www.ajaint.com
Tel: 1-781-545-7365
E-mail: topgun@ajaint.com
SmartSource® E-Beam Gun
SmartSource is a water-cooled electron-beam gun  that features a unique interlocking crucible cover. This feature is designed to prevent any cross-contamination of source materials between pockets or debris from the top cover. CHA’s patented Smart-Source eliminates cross contamination by having a physical barrier across the clearance gap of the crucible cover that lifts to allow the rotation of the turret, and then lowers and engages with the turret. The crucible cover has a ‘key’ ridge that fits perfectly into the groove on each side of the crucible cover. This completely closes the clearance gap, eliminating this source of cross contamination. Plus, no material is ever evaporated while the crucible cover is raised and lowered.
CHA Industries
Fremont, CA
Tel: 1-510-683-8554
E-mail: sales@chaindustries.com
CC-105 Cold Cathode Ion Source
The Denton Vacuum CC–105 Ion Source  is one of the most stable, broad beam, ion sources on the market today. Either running with argon in a reactive background, nitrogen or pure oxygen, the CC-105 will produce high-density, pinhole-free, moisture stable films for Precision Optics applications or applications where exact control of film properties is crucial. A 37-mm aperture and proprietary gas distribution provide a broad beam divergence for excellent coverage, while the dual filament configuration supports uninterrupted operation in the event of a filament failure. The independent gas control and watercooled anode, coupled with Xantrex power modules provide stability and repeatability to this device. Low cost and compact, the Xantrex supplies come with a 5-year manufacturer warranty. This device is easily fitted to existing systems, or, is offered with each system sold by Denton. Process support is also available for new users. Through extensive process development, it is a highly stable device that is quickly gaining acceptance in the thin film industry. A high power CC series Ion Source will be available too in the near future.
Denton Vacuum, LLC
Moorestown, NJ
www.dentonvacuum.com
Tel: 1-856-439-9100 or Toll-free 1-888-336-8661
E-mail: info@dentonvacuum.com
Z-Gun™ Magnetron Sputter Source
Dexter’s newly developed Rotating Magnetron Guns (ZGuns™ ) are specifically engineered for the demanding requirements of data storage media producers. Integration with a new system or retrofitting an existing system is facilitated by Dexter’s new design and control interface. The Z-Guns and magnet arrays can be optimized to produce a cathode capable of sputtering highly permeable materials such as nickel, iron and cobalt; or, coupled to modules specifically designed for a given target material or customer application. The magnetic films used in perpendicular media require a relatively thick soft underlayer (SUL) not found in films of longitudinal media. To minimize target changeover for this layer, Z-Guns allow end users and OEMs to run thicker targets up to and over 12mm depending on the SUL target material. Z-Guns offer a high sputtering efficiency because the source to substrate distance has been optimized while maintaining deposition uniformity. The guns can also produce radial anisotropic magnetic films. The mechanics of our Z-Guns provide a more robust design that can withstand the strong magnetic attractive forces created between the magnetic target and the high flux density magnetron while providing the flexibility for quick repairs and magnetic field adjustments. In most applications, customers are trying to maximize target utilization and achieve optimum uniformity. Our gun is capable of achieving both, along with radial magnetic anisotropy and zero re-deposition.
The Z-Gun sputtering sources feature a unique "magnet array’ which is completely isolated from the cooling water to eliminate magnet deterioration and subsequent degradation of source performance. This design permits easy access to the internal magnetic component arrangement thus allowing quick changes to the magnet array. The Z-Gun sputtering sources are sleek and compact. They feature programmable, high torque, DC motor drives along with a touch screen user interface. Rotational speed, phase shifting between coincident magnetron pairs, and z-position can be programmed for specific targets and processes. The program can maintain fixed set of variable routines or allow dynamic changes in the routines to optimize performance as target erosion changes critical system parameters. Magnetron synchronization is another feature that can be programmed by the user. The evolution of this product has resulted in the most service friendly product of its kind on the market, thereby providing maximized up time and frustration-free maintenance.
Dexter Magnetic Technologies Inc.
Hicksville, NY
www.dextermag.com
Tel: 1-516-822-3311
E-mail: info@dextermag.com
EV 1 Series Single Hearth Electron Beam Evaporators
Ferrotec (USA) Corporation’s EV 1 Series Single Hearth Electron Beam Evaporators are designed for high rate evaporation and ultra clean process requirements combined with competitive pricing. All sources are available in UHV versions to support bakeout temperatures of more than 250°C. Typical applications are production coatings or laboratory-scale evaporations as well as high purity Molecular Beam Epitaxy (MBE). www.ferrotec.com
EV S6 and S8 Multi-Hearth Electron Beam Evaporators
Ferrotec (USA) Corporation’s EV S6 and   EV S8 Multi-Hearth Electron Beam Evaporators are unique in that the vacuum compatible stepper motor and water cooling are inside the evaporator rather than outside the chamber. This means that the EV S is not constrained by a motion feedthrough and can operate in any location or height in the chamber. This flexibility in positioning makes it ideal for applications such as production coatings or laboratory-scale evaporations under changing conditions or for developing new processes. It is also ideal for system retrofits, unlike with a traditional evaporator, there is no need for baseplate holes to be a specific size or in particular location and for system design R&D where is it advantageous to be able to easily move the gun in 3 dimensions. www.ferrotec.com
Genius Electron Beam Evaporation Controller
Ferrotec (USA) Corporation’s Genius Controller is one of the most advanced electron beam evaporation controllers available. It contains all the features usually available separately, such as emission control, HV control, filament control, high frequency beam sweeps and pocket selection, in a single compact unit measuring only 19-inches × 3U. All parameters can be adjusted through RS232 or by the remote control unit. The Genius digitally stores up to 99 sets of evaporation parameters and offers several levels of password protection. A more advanced version, the Genius Pro includes additional beam sweep patterns such as spirals, stars and dynamic defocusing capability. www.ferrotec.com
Carrera High Voltage Power Supply
Ferrotec (USA) Corporation’s Carrera  High Voltage Power Supply is a compact and versatile primary switched mode electron beam power supply. It is available in 3, 5, 6, 10 and 12 kW versions. It’s industry leading arc management system uses an intelligent arc recognition system which, combined with the high switching frequency of the power unit, ensures arcs are detected and suppressed within 1µs and full arc recovery occurs within 3 ms. A user-controllable threshold limit for the acceptable arc rate enables process integrity to be maintained for processes prone to arcing such as ion-assisted deposition. A complete range of feed-throughs (water, HV, magnet, etc.), flanges and fittings to facilitate installation of your system.
Ferrotec (USA) Corporation
Nashua, NH
www.ferrotec.com
Tel: 1-603-883-9800
E-mail: info@ferrotec.com
Replacement Parts for Major Manufacturers of Ion Source Systems
Fil-Tech Inc. supplies replacement parts for major manufacturers of ion source systems. These replacement parts include tungsten filaments, a complete selection of insulators, and gas distributors in graphite, stainless steel, and titanium. Fil-Tech also supplies anodes in graphite and stainless steel. Fil-Tech also offers savings on hollow cathode replacement parts including cathode tips, keepers, and required insulators. All Fil-Tech parts meet or exceed original manufacturers’ specifications. www.filtech.com
Emitter Assemblies and Replacement Parts for Major Suppliers of E-Beam Systems
Fil-Tech Inc. supplies complete emitter assemblies and replacement parts for major suppliers of e-beam systems. Replacement parts include filaments, insulators, beam formers, anodes and OFHC copper crucibles. In addition, Fil-Tech supplies graphite, molybdenum and titanium crucibles liners. Also available is a new, safer, user friendly electromagnetic coil with a machined stainless steel connector eliminating lose wires on exposed screw type terminals. The Fil-Tech coil is a drop in replacement. Fil-Tech’s replacement parts will meet or exceed specification of the original manufacturer at considerable savings and are available from stock. www.filtech.com
Silicone-Based Diffusion Pump Fluids for Deposition Processes
Fil-Tech Inc. supplies silicone-based diffusion pump fluids for deposition processes. Fil-Tech offers savings on DC702, DC704, and DC705.  Fil-Tech also supplies FT702, FT704, and FT705, functionally equivalent silicone fluids. These fluids can be mixed and/or reprocessed together in any portion with their respective counterpart. Other diffusion pump fluids include Santovac 5 for silicone free ultra high clean applications. Fil-Tech offers cost-effective mechanical pump fluids, FT19, FT20, FT77, FT87, and FT9, which are molecularly distilled hydrocarbons for non-corrosive applications including rotary vane and piston drive pumps, and roots blowers. FTTW, technical white, is recommended for reactive or corrosive applications. www.filtech.com
Longer Life Gold™ Quartz Crystals for Deposition
Fil-Tech, Inc.’s an exclusive Longer Life Gold™ Quartz Crystals. Laboratory experiments have shown over a 200% increase in crystal life with deposited magnesium fluoride on Longer Life Gold Crystals. Fil-Tech recommends Longer Life Gold Crystals with anti-reflective processes and high stress depositions. Fil-Tech also offers our standard Gold and Stress Relieving Alloy™ Quartz Crystals. Fil-Tech’s Stress Relieving Alloy Crystals are the most stable crystal for anti-reflective processes and high stress depositions including silicon monoxide, silicone dioxide, magnesium fluoride and titanium dioxide. The Alloy crystals have shown 400% increase in crystal life when depositing magnesium fluoride with a longer period of steady, jump free oscillation. In addition Fil-Tech also supplies high purity chrome plated tungsten rods with minimal spitting and even burning. Fil-Tech also introduces a new line of its Quality Crystals™ for Liquid Plating applications.
Fil-Tech, Inc.
Boston, MA
www.filtech.com
Contact: G. Paul Becker
Tel: 1-800-743-1743 and 1-617-227-1133 in MA
E-mail: paul@filtech.com
Integrated Reactive Sputtering Solutions
For customers who do not require a complete turnkey facility, but would like a package of critical pre-configured components for their process needs, Gencoa has options. By combining the Speedflo reactive gas controller with Gencoa dual magnetrons, a customer has the components needed for success—just add the chamber, pumping and power. The integrated packages include sputtering hardware, process monitoring, process control software, reactive gas distribution and training. The package is preconfigured for the specific process needs to create the uniformity, process speed and performance you require. Typical applications include web-coating of dielectric stacks, precision optics/ opthalmics, hard/low friction coatings, architectural glass and flat panel displays. Any material combination can be used with single or multi-channel gas control. Process monitoring can be via plasma emission or target voltage and the gas system is designed for fast feedback and uniformity adjustment. The magnetic design in the sputter cathodes is tuned to create the optimum plasma conditions for the process environment as a critical feature of the package. www.gencoa.com
Multi-functional Linear Ion Source
Gencoa has developed a flexible ion source to satisfy  the needs for both high energy and low energy cleaning of substrates. For aggressive cleaning, the source can be operated at 3kV to produce a high energy bombardment of glass and metal substrates. For temperature sensitive and web type substrates, the discharge voltage can be reduced to less than 500 volts to prevent damage. The sources come with a wide range of mounting options and have low cost, long-life and quick change anode/cathode parts. The anode material can be interchanged between metals and graphite. The use of a thick graphite anode allows high current densities to be used as result of the low sputter yield of carbon. Metal and alloy anodes can be used to provide sub-plantation (high-energy mode) or seed layers (low energy mode) on the cleaned surface.
Gencoa Ltd.
Liverpool, United Kingdom
www.gencoa.com
Tel +44-0151-486-4466
E-mail: sales@gencoa.com
High Quality Sputtering Targets, Evaporation Materials
KAMIS offers high-quality sputtering targets, evaporation materials, crucible liners and other metals. For two decades, KAMIS has worked with the semiconductor industry, top research faculties and universities around the world. KAMIS has a wide variety materials that are in stock. KAMIS can also manufacture materials to your unique and specific requirements. KAMIS also provides quality service. For a specific question or requirement on sputtering targets, evaporation materials, crucible liners, metal foil, sheet, plate, rod and wire, KAMIS’ technical staff is ready with the expert knowledge to help you with your project.
KAMIS, Inc.
Mahopac Falls, NY
Linearly Moving Magnetron (LMM™ )
With KDF’s LMM™ technology, the plasma is swept across the target to achieve a uniform full-face target erosion and high target utilization. The LMM cathode is, by design, a superior technology in terms of process stability and repeatability from run-to-run and over the target’s life time. This translates to higher productivity and cost savings. www.kdf.com
Sputtering Targets
KDF has a large selection of high purity  metals, alloys, nonmetallic and cermets for virtually every sputtering and evaporation application in the industry. KDF’s facility manufactures production quantities of these materials but is also capable producing of small quantities for research applications at competitive prices. This manufacturing flexibility demonstrates commitment to actively anticipating and meeting the needs of customers. High purity sputtering targets are available in a variety of geometries, including planar, circular, conical, rectangular, ring, delta and custom configurations. KDF incorporates material processing techniques that include: Vacuum induction melting; vacuum/ inert hot pressing; hot/cold isostatic pressing; electron beam melting; and computer controlled machining. KDF supplies Chi, Mu, Muset (one piece) and Upsilon Inset™ Cathode™ target materials in a wide variety of materials. In addition KDF supplies conversion kits that enables conversion of existing Inset Cathode™ configuration from one style to another. All KDF manufactured targets are shipped with a Certificate of Conformance; Material Purity Certificate; and a MSDS (Material Safety Data Sheet) when required. Each target is chemically cleaned, marked and carefully packaged under vacuum or inert gas as required by the individual target. To preserve the purity of these targets, handle only with rubber gloves.
KDF Electronics
Rockleigh, NJ
www.kdf.com
Contact: Todd Plaisted, Director of Sales and Marketing
Tel: 1-201-784-5005
E-mail: todd@kdf.com
TORUS® R&D Magnetron Sputtering Guns
Proven reliability and performance for over 20  years. Lesker’s TORUS® sputtering guns have a long history of success in the sputtering of magnetic materials, insulators, semiconductors, or metals. With a wide variety of mounting styles TORUS Sputtering guns can fit into any application. We provide sputtering solutions, installation, service and training. Complete packages including power supplies are shown at . Contact for more information. www.lesker.com
TORUS® Production Magnetron Sputtering Guns
High performance Lesker sputtering guns for use in large area coatings and production applications. Production proven and patented magnet technology yields the highest target utilizations achievable, long target lifetimes, and greater up-times. Magnetrons with superior performance for magnetic materials and transparent conductive oxides are available. We provide sputtering solutions, installation, service, and training. Complete packages including power supplies are available at . Contact for more information. www.lesker.com
TORUS UHV Magnetron Sputtering Sources
The Kurt J. Lesker Company  Torus® UHV magnetron sputtering sources are true UHV sources: they are designed to be compatible with system base pressures below 10-10 Torr. The Torus UHV sources use no O-rings, and the magnet assembly is completely removable without breaking vacuum. These sources are equipped with a state of the art magnet assembly that can be adjusted in-situ. This allows the user to optimize the magnetic field (and thus the deposition characteristics) of the source for specific target materials. These true UHV sources are ideally suited for applications that require ultra pure films deposited in a true UHV environment. All Torus UHV sources utilize simple, clamped, disk shaped targets are RF, DC and pulsed DC compatible, are available in balanced and unbalanced versions, can be used to sputter metallic, magnetic, and insulating targets and can be supplied with numerous options including: direct gas injection, deposition chimneys, and cluster configurations. Torus UHV sources are available in 2-inch and 3-inch diameters and several insertion lengths. Contact for more information. www.lesker.com
LTE Thermal Organic Evaporation Sources
The Kurt J. Lesker Company’s LTE evaporation sources are designed specifically for the deposition of organic thin films. The family of thermal evaporation (effusion) sources covers a range of temperatures required for thin film deposition of volatile, highly temperature sensitive organic or organic-metallic materials. The LTE Low Temperature Evaporation Source is ideal for depositing organic thin films requiring precise control (± 0.1 C) of source temperatures from 100°C to 600°C. The “plug-in” design feature makes material replenishment and maintenance efficient and trouble free. This source is available with effusion cell capacities from 1cc and up to 35cc. Complete packages including power supplies are available at . Contact for more information or to discuss evaporation needs. www.lesker.com
HTE Thermal Evaporation Sources
Kurt J. Lesker Company’s HTE evaporation sources offer a highly controllable alternative to traditional thermal evaporation. The high temperature furnace offers direct thermocouple control of evaporation for a range of materials up to 1500°C. The UHV compatible construction, small footprint, and outstanding temperature control make the HTE thermal evaporation source an ideal alternative to expensive Knudsen cells. This source is available with capacities from 1cc and up to 35cc. Complete packages including power supplies are available at . Contact for more information. www.lesker.com
KJLC Thermal Evaporation Sources
The Kurt J. Lesker Company  manufactures resistive thermal evaporation sources for use in many types of decorative and research and development applications. These thermal evaporation sources are either filament coiled, metal boat, or crucible type, and are mounted onto a 2.75-inch CF flange with linear motion also available. The sources utilize a Kurt J. Lesker Company manufactured power supply for operation in various power ranges. Contact for more information. www.lesker.com
KJLC Thermal Evaporation Kits
The Kurt J. Lesker Company manufactures sequential and co-deposition  versions of this platform for use in production and R&D application. The kit is supplied with all relays, switches and shutters needed for a variety of thin film depositions. This platform can be configured to use filaments, boats or crucibles. The Standard mounting flanges are an ISO 250 or 12” CF with custom mounting options available. Complete packages including power supplies are shown at . Contact for more information. www.lesker.com
KJLC Ion Sources
The Kurt J. Lesker Company’s lines of filamentless DC ion sources are ideal for applications involving ion assisted deposition, plasma cleaning, oxiding, nitriding, as well as surface modification. Lesker ion sources are UHV and reactive gas compatible and use no thermionic emitter so that they may be operated in inert environments. Each ion source includes the ion source, power supply, cabling, feedthroughs, flexible internal utilities, remote swivel/rotating mounting collar (flange mount is optional), and choice of molybdenum or graphite grids. Kurt J. Lesker Company offers the following filamentless DC ion sources: 3 cm, 5 cm and 10 cm. Contact for more information.
Kurt J. Lesker Company
Clairton, PA
www.lesker.com
Contact: Justin Poziviak or Rob Belan
Tel: 1-800-245-1656 or 1-412-387-9200
PVD Deposition Sources
LAC Engineering specializes in vacuum technology and in particular in deposition sources.In the case of PVD (Physical Vapour Deposition), the deposition sources have a significant effect on the quality of the surface coatings. Generally speaking, they can be adapted to different applications, but often the performance is not sufficient to meet output and quality requirements. LAC Engineering solutions are developed using the knowledge and experience of our engineers and with the help of 3D computer modeling and magnetic simulation tools. LAC Engineering is able to provide deposition sources optimized for the application and offering excellent value. They are manufactured entirely in Switzerland on one site to guarantee a better response as well as a high quality, local service. State-of-the-art application and quality control are carried out in our class 1000 clean room laboratory. The product range meets the needs of research laboratories and industry, for sputtering and cathodic arc PVD equipment.
L.A.C. Engineering
Ch. Du Pont-du-Centenaire 109 CH Switzerland
Tel: +41 22 794 47 58
Evaporation Sources for Organic Materials
The Luxel Organic Source provides the ability to deposit volatile organic materials such as required by the Organic LED industry. Temperature control to 0.1°C allows for precise deposition rate control. Tuning modes prevent temperature overshoot and assure a high quality, uniform film. Multiple sources may be arrayed in order to co-deposit dyed films for color displays. Features of OLED I and II organic sources include: unique design for use with LTE (low temperature evaporation) of volatile organics; operates at low temperatures with superior thermal control in 50 – 600°C range; about 60% the cost of comparable Knudsen cell; performance: Ability to grow uniformly on 5" substrates at rates greater than 2 •/sec; ideal for use in tandem for co-deposition of dye-doped organic emissive films; alumina crucible evenly distributes temperature and reduces organic spitting; provides for easy access to crucible for cleaning; easy to install with single bolt mount coupling; compatible with Luxel deposition rate power controllers; and distributes coatings evenly by directing vapor.
Luxel
Harbor, WA
Tel: 1-360-378-4137
Delta Glow RF Plasma Source
Manitou Systems introduces a new model in the Delta  Glow RF plasma source family; the “Delta Glow Integrated” (DGi). The DGi is a complete ICP plasma source + RF power system integrated in a shoebox sized enclosure. It’s compact size enables mounting directly to a plasma process chamber to perform downstream or upstream processes. High conversion efficiency enables this model to perform processes including: chamber cleaning using reactive gas; exhaust gas neutralization/abatement (positioned between the chamber & pump); process gas pre-activation in reactive sputtering environments; substrate conditioning in a upstream mode; and it is used as a primary downstream plasma source on CVD systems. The Delta Glow products also find many applications in developmental laboratories including providing plasma environments to modify surface properties of plastic substrate surfaces in the manufacture of medical devices, testing of gaseous lamps and modification to powered (nano) materials. Delta Glow integrated models are comprised of Manitou’s field proven building blocks starting with a 13.56 MHz 600 watt RF power generator plus preset impedance matching network. These sub-systems plus a highdensity plasma reactor tube sit on a water chilled aluminum base plate. Access to the plasma reactor section is easily made using industry standard KF-50 seals and flanges. All (analog) user controls are made available through a DB15 connection port. Various models are available to address the process requirements of reactive and non-reactive processes. OEM versions include specialized vacuum flanges as well as operating control and reporting features.
Manitou Systems Inc.
Newton, CT
Tel: 1-203-270-8797
SunSource™ Planar and Round Magnetron Sputtering Sources
The Materials Science, Inc. SunSource™ sputtering sources feature 20% higher rates; active plasma discharge on nearly entire target surface; power levels can exceed 500 watts/in2 for directly water cooled targets; 35-40% target utilization; low 10-4 Torr range operation; and argon gas through cathode body with no need for additional feedthroughs and manifolds. Their uniform target erosion and distribution; stable operation throughout target lifetime; internal and flange mount versions; can be used in DC, pulsed DC, AC and RF modes; and “unbalanced” magnet modules can be supplied as opposing pairs or for single sources. The round sputtering sources are available in 4” to 8” diameter targets with internal and flange mount configurations; gas injection through cathode body-additional feedthroughs & manifolds unnecessary active plasma discharge on nearly entire target surface significantly reduces insulating film growth and arcing, 35-40 wt% target utilization; low 10-4 Torr operation; uniform target erosion and distribution and can be used in DC, pulsed DC, AC and RF modes.
Materials Science, Inc.
San Diego, CA 92109
Tel: 1-858-483-3223
Miniature Evaporation Systems—e-Vap® Mighty Source™ 4 Pocket Evaporation Source
MDC introduces the e-Vap® “Mighty   Source™ ”– a 4 pocket × 2cc rotary electron beam source. Affordable and extremely compact, it stands just 2.4-inches tall by 4-inches long by 2.8-inches wide. The Mighty Source™ is rated for 3 kilowatts of power that makes it an ideal deposition tool for evaporating metals, oxides, metal-oxides, and magnetic materials. Designed into the source body are two hermetically-sealed XY-axis sweep coils that allow users to sweep the electron beam across the crucible pocket, resulting in the maximization of your coating process in terms of material stability and consistency. The Mighty Source™ design is specifically tailored for the following uses – pilot production, lab/R&D applications, and the university marketplace. Its compact design features allow it to be mounted onto a 2-3/4-inch Del-Seal CF flange or onto a 6-inch or 10-inch Del-Seal CF flange in either horizontal or vertical configurations. To complete this product system, MDC also offers a 3kw power supply and low cost XY sweep controller. www.mdcvacuum.com
e-Vap® Modular Evaporation Sources—Individual Source
MDC’s modular e-Vap® sources are state-of-the-art electronbeam evaporation sources designed for the demanding and exacting world of vacuum coatings. This selection of electron-beam evaporation sources provides vacuum coating solutions for most applications including medical, metallurgical, tele-communications, micro-electronics and optics. Modular sources are offered in six standard frame sizes and are stand alone components for maximum installation flexibility in existing vacuum systems. For those requiring standard off-the-shelf solutions, complete horizontal and vertical flange mounted systems are also available. Modular sources are fitted with direct water-cooled crucibles. Select models have indirectly cooled crucibles that allow the user to change crucibles without interrupting the flow of water to the source and without having to disassemble the source. Modular sources are offered with material capacities from 6cc to 400cc in a multitude of pocket geometries and arrangements. They are available in both fixed and rotary pocket mechanisms for high and ultrahigh vacuum environments. e-Vap® modular sources are designed for optimum performance with e-Vap® power supplies, controls and electronics. Other essential components and hardware required for the installation of e-Vap® modular sources are detailed starting on page. Custom electron-beam evaporation sources are available. www.mdcvacuum.com
Horizontal Source Assembly
MDC has eliminated the difficulties of flange mounting  electron beam sources. Problems associated with designing and fitting sources into coating systems are solved with the introduction of standard horizontal flange mounted evaporation sources. The compact footprint of these flanged evaporation systems allows the installation of up to three individual sources onto one ten-inch chamber. The flanged assemblies include an electron beam source with all water and electrical connections. A guide rod option provides a drawer like sliding action for installation and system maintenance. Horizontal flange mounted assemblies come ready to accept this guide rod kit. Another option includes a water-cooled roof, which mounts directly above the e-Vap® source. The watercooled roof acts as a heat barrier between the source and substrate and also prevents vapor condensation on chamber walls. The water-cooled roof is fitted with a deposition port angled towards the substrate, which aids in deposition uniformity, even when source and substrate centerlines are offset. Horizontal systems purchased with a source control module are fitted with flange-mounted filament transformers. www.mdcvacuum.com
Vertical Source Assembly
MDC has eliminated the difficulties of  flange mounting electron beam sources. The effort that goes into designing and fitting a source to a vacuum coating chamber has been done for you with the introduction of standard vertical flange mounted evaporation sources. The flanged assembly includes one 7cc electron beam source with all water and electrical connections. This type of flange mounted system is typically installed vertically through the bottom side of a chamber. The compact footprint of these flanged evaporation systems requires only one port flange for installation. A popular option commonly ordered with these systems is a water-cooled roof, which mounts directly above the e-Vap® source. The water-cooled roof acts as a heat barrier between the source and substrate and also prevents vapor condensation on chamber walls. The water-cooled roof is fitted with a deposition port, angled towards the substrate, which yields excellent deposition uniformity, even when source to substrate centerlines are offset. The single-pocket source comes standard with a 7cc capacity crucible. The same assembly can be fitted with larger capacity sources including 15, 25 and 40cc versions. To order the larger volume crucible option add one of the three option numbers to the end of the assembly part number. Vertical systems purchased with a source control module will be fitted with flange-mounted filament transformers. www.mdcvacuum.com
Custom Source and Source Assemblies
Custom source and source assemblies can be designed to fit an existing chamber or for a special application. Contact MDC for details regarding custom source assemblies or custom sources. They are available in six frame sizes; single, multipocket or carousel crucibles; custom crucible configurations available; crucible sizes from 6cc to 400cc; power ratings from 6kW to 15kW; and direct or indirect water cooling.
MDC Vacuum Products Corporation, Thin Film Group
Hayward, CA
www.mdcvacuum.com
Contact: Ken Allen
Tel: 1-510-265-3500
E-mail: Kallen@mdcvacuum.com
Baffled Box Sources for SiO, ZnS
The R. D. Mathis Company “Baffled Box”  Silicon Monoxide Source (SiO) source, has proven to be successful for depositing silicon monoxide. The source material is positioned in the boat within separate cavities, when heated it follows an indirect path through a series of baffles and then out of the exhaust chimney. The substrate cannot see the bulk material at any time. This essentially eliminates any chance of spitting and streaming which causes pinhole type defects. Many of the sources are available with up, down or horizontal exhaust ports. Custom fabrication and larger volume sources to fit your specific process needs are available upon request.
The R.D. Mathis Company
Long Beach, CA
www.rdmathis.com
Tel: 1-562-426-7049
E-mail: info@rdmathis.com
High-Performance Cathodes
Sierra Applied Sciences, Inc., is the industry  leader in high performance cathode technology. With our superior designs, customization and diverse cathode product lines, we can support and address any complex deposition application for all customers ranging from decorative to magnetic media. We also offer advanced customized designs for ITO applications that allow for lowest possible voltage operation and the highest conductivity films possible in the market today. These types of innovated designs, along with our patented magnetics allows our customers to achieve the highest target utilization possible with far superior quality films compared to our competition. We also offer the largest variety of cathode sizes, configurations, and mounting options for today’s complex applications. We at Sierra support our products with the highest level of quality and service our customers require. We do not disappear once our units have been delivered, we’re there for all and any after market customer support for the life of our products. It’s no wonder that close to 80% of our annual business is repeat customers who only choose to buy from Sierra. Sierra’s pre-purchase performance and best price guarantee makes buying easy and risk free.
Sierra Applied Sciences, Inc.
Boulder, CO
www.sierraapplied.com
Tel: 1-303-440-0861
E-mail: info@sierraapplied.com
E-Beam Sources
Telemark offers the broadest range of multi-pocket rotatable, single pocket UHV, and linear UHV electron beam sources. Options for arc-suppression sources, reduced beam curl magnetics sources, self-sealing cover plates, large inventory sources and crucibleless sources are available on specific models. Rugged, reliable construction; designed for ease of use and maintainability; side or bottom crucible rotation drive; plug-in emitter assembly for easy filament replacement; all components are maintained in stock. www.telemark.com
E-Beam Tetrode Power Supplies
Telemark produces a wide range of general purpose and production power supplies for electron beam systems. Power ranges are 3 kW, 6 kW, 8 kW, 10 kW, 15 kW, and 20 kW in the rugged and reliable Tetrode Tube style for maximum flexibility and field serviceability. Dual and triple source options available on the 10 kW and 15 kW models.. All supplies come with standard X-Y Sweep controllers with several built-in and adjustable patterns or can be upgraded to fully programmable “Cheetah” X-Y sweep controllers. www.telemark.com
E-Beam Switching Power Supplies
Telemark has recently introduced the “CHEETAH” 6kW and 8kW switching power supplies with output voltage variable from 0 to -10kV. Extremely fast arc recovery <50µs. Rack Mount. Both come with an innovative Digital Programmable Sweep. Patterns are viewable from the LCD Screen and can be edited on the fly to change size, frequency, rotation, profile and location.
Telemark
Hayward, CA
www.telemark.com
Contacts: Gary Henderson, President or Kim Vally, Sales Assistant
Tel: 1-510-887-2225
E-mail: sales@telemark.com
E-beam Filaments
Thin Film Supply.com offers  competitive pricing on quartz crystals (15% less than the leading brands), ultra-high vacuum aluminum foil, evaporation materials, E-beam filaments, ceramic retainers, and more. Free shipping in US for all online orders. Crystals are available in 5 and 6 MHz gold, alloy, or silver UHV Foil and evaporation materials.
Thin Film Supply.com
Windsor, CO 80550
www.ThinFilmSupply.com
Tel: 1-970-674-9825
E-mail: sales@thinfilmsupply.com
Thin Film and Nanotechnology Sources
Torr International, Inc. specializes in Thin Film & Nanotechnology Equipment. The current range of products include Standard Table Top low-priced Magnetron Sputtering systems for diverse applications, from specimen preparation for SEMs to R&D with metal, dielectric and polymer films to Custom-built multi-target sophisticated systems for special applications. We also manufacture Thermal and E-Beam Evaporation systems to suit customers’ needs and specialize in Etching systems with different configurations for corrosive and standard applications. We serve a worldwide market in the areas of Thin Film Deposition and Etching as well as high vacuum technology. We also supply all the accessories needed for Thin Film Deposition work.
Torr International, Inc.
New Windsor, NY
www.torr.com
Tel: 1-845-565-4027 or 1-845-565-6637
E-mail: torr@torr.com
Anode Linear Layer Sources
Veeco’s high power anode layer ion  sources are scalable in either circular or linear geometries in excess of three meters and feature high current density operation from high vacuum up to milliTorr pressure ranges. The sources provide both gridless and filamentless operation with all inert and reactive gases. The sources’ low maintenance, independent beam energy and current control make them excellent for processes requiring long, uninterrupted production runs. Round and linear anode layer sources are ideal for a wide variety of applications, such as architectural/automotive glass, flat panel displays, web coating, ophthalmic, precision optics, data storage and semiconductor. Veeco offers the following Anode Layer Ion Sources: ALS40C; ALS340L; ALS1000L; ALS1500L; ALS2540L; and ALS3250L. www.veeco.com
Isoflux Cylindrical Magnetrons
Veeco brings its considerable ion beam experience to our  Isoflux Cylindrical Magnetrons (ICM). These sputtering sources use cylindrical targets to surround the substrate with coating materials. Used to coat complex 3-dimensional shapes, wires and fibers the ICM design is more efficient than planar magnetrons and offers high deposition rates, excellent target utilization, less downtime and relatively inexpensive targets. Veeco offers the following Isoflux Cylindrical Magnetrons: ICM-516; ICM-1921; and ICM-3421. www.veeco.com
Gridded DC Ion Sources
Veeco’s DC ion sources come in either circular or linear geometries and are easy to install, clean and maintain. These ion sources produce, broad, uniform, monoenergetic ion beams that are used in a variety of research and production applications, most of which involve surface modification, such as etching and deposition. DC sources are ideal for operation in inert environments or very short duration operation in oxidizing environments. Veeco offers the following DC Ion Sources: 3 cm DC; 5 cm DC; 8 cm DC; 11 cm DC; 12 cm DC; 15 cm DC; 21 cm DC; 6 × 30 cm DC; 6 × 40 cm DC; and 6 × 50 cm DC. www.veeco.com
Gridded RF Ion Sources
Veeco’s filamentless RF ion sources are low  maintenance and ideal for processes using 100% argon, oxygen or other reactive gases. They come in either circular or linear geometries. RF sources produce broad, uniform, monoenergetic ion beams in both inert and oxidizing environments. An optional 4-grid design offers very high collimation. In addition, these sources have very long maintenance intervals, making them ideal for both batch and load-locked production processes. Veeco offers the following RF Ion Sources: 3 cm RF; 6 cm RF; 12 cm RF; 16 cm RF; 16 cm High Power RF; 6 × 22 cm RF; 6 × 66 cm RF; and 6 × 110 cm RF. www.veeco.com
Gridless End-Hall Ion Sources
Using intense magnetic fields and substantial electron currents, Veeco’s low maintenance, gridless ion sources produce a very high current density at lower energies than is practical with gridded sources. Gridless sources are available in several sizes and can be configured with or without filaments, depending upon the process requirements. Veeco offers the following Gridless End-Hall Ion Sources: Mark I+ and Mark II+.
Veeco Process Equipment
Fort Collins, CO
www.veeco.com
Contact: Mike Meyer, Product Marketing Manager
Tel: 1-970-221-1807 Ext. 297
E-mail: mmeyer@veeco.com
Pre-Melted Oxide Evaporants
Rounding out our comprehensive line of thin film  products, CERAC, Inc. now offers a series of pre-melted refractory oxide evaporation materials that are designed for immediate use in your evaporation process. These products deliver cost savings by saving pre-processing time in the coating chamber, thus reducing non-productive chamber time. Their increased density over sintered materials allow for longer coating runs, and minimized outgassing/spitting behavior provides improved coating yields for challenging applications. Cones, rods, discs and pieces are manufactured using either our own raw materials, or our customer’s currently qualified source material. We offer sizes for use in all standard e-beam coating platforms, or products can be customized to fit any individual crucible or pocket. These value-added products are supported worldwide with an infrastructure of sales, support and specialized technical assistance. The standard line of pre-melted materials currently includes Al2O3, HfO2 (white or black), Ta2O5, TiO2 and ZrO2.
Williams Advanced Materials Inc., CERAC, Inc.
Milwaukee, WI
www.williams-adv.com
Tel: 1-414-289-9800
ceracinfo@beminc.com or lisa_bruce@beminc.com
ADDENDUM
FEBRUARY 2008
This correction updates the VT&C February 2008 Leak Detector Product Showcase. The listings inadvertently used the wrong photograph for the PhoeniXL 300 Helium Leak Detector from Oerlikon Leybold Vacuum USA, Inc. We apologize for the oversight.
PhoeniXL 300 Helium Leak Detector
The PhoeniXL 300 Helium Leak Detector from Oerlikon Leybold Vacuum is a mobile helium leak detector suited for use in quality control labs, series production and service. The PhoeniXL is qualified for many applications in industry and research including manufacturing of components, air conditioning systems, bulk tanks and vessels, analytical instruments, power plants and other systems requiring high vacuum engineering leak testing including clean-room conditions such as those in the semiconductor industry. An optional sniffer probe allows for PhoeniXL to be used as a sniffer leak detector. The PhoeniXL is easy to handle providing reliable measurement results, quick readiness for operation, fast response time and automatic calibration. The available LCD Display shows a trend mode, bar mode, universal display, vacuum diagrams and status information. Primary features include: lowest detectable leak rate for helium is < 5 × 10-12 mbar L/Sec; ready for operation in < 3 minutes after start-up; Helium pumping speed is 2.5 liters/second; counter flow design principle extends the service life for cathodes; normal operation at 15 mbar vacuum inlet pressure; ability to detect hydrogen in addition to helium and an exclusive 36 month warranty for the ion source. The PhoeniXL300 has an ergonomic and compact design. The PhoeniXL is maintenance-friendly, while the logical separation of its mechanical and electrical components enhance accessibility. All parts can be removed and replaced with ease. The integrated remote control is equally well suited for both right- and left-handers.
Oerlikon Leybold Vacuum USA, Inc.
Export, PA
Contact: Mike Ridenour
Tel; 1-800-764-5369
E-mail: mike.ridenour@oerlikon.com
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Vacuum Technology & Coating